Issued Patents All Time
Showing 26–50 of 82 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10553516 | Semiconductor microcooler | Donald F. Canaperi, Daniel A. Corliss, Dinesh Gupta, Fee Li Lie, Kamal K. Sikka | 2020-02-04 |
| 10490480 | Copper microcooler structure and fabrication | Fee Li Lie, Kamal K. Sikka, Donald F. Canaperi, Daniel A. Corliss, Dinesh Gupta | 2019-11-26 |
| 10490481 | Copper microcooler structure and fabrication | Fee Li Lie, Kamal K. Sikka, Donald F. Canaperi, Daniel A. Corliss, Dinesh Gupta | 2019-11-26 |
| 10386716 | Mechanical isolation control for an extreme ultraviolet (EUV) pellicle | — | 2019-08-20 |
| 10388521 | Method to increase the lithographic process window of extreme ultra violet negative tone development resists | Nelson Felix, Martin Glodde | 2019-08-20 |
| 10347486 | Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography | Ekmini Anuja De Silva, Nelson Felix, Daniel A. Corliss, Rudy J. Wojtecki | 2019-07-09 |
| 10345702 | Polymer brushes for extreme ultraviolet photolithography | Martin Glodde, Ankit Vora | 2019-07-09 |
| 10312087 | Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography | Martin Glodde | 2019-06-04 |
| 10276384 | Plasma shallow doping and wet removal of depth control cap | Robert L. Bruce, Kevin K. Chan, Sebastian U. Engelmann, Marinus Hopstaken, Mahmoud Khojasteh +3 more | 2019-04-30 |
| 10241396 | Mechanical isolation control for an extreme ultraviolet (EUV) pellicle | — | 2019-03-26 |
| 10096477 | Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography | Martin Glodde | 2018-10-09 |
| 9950349 | Drying an extreme ultraviolet (EUV) pellicle | — | 2018-04-24 |
| 9915867 | Mechanical isolation control for an extreme ultraviolet (EUV) pellicle | — | 2018-03-13 |
| 9465290 | Near-infrared absorbing film compositions | Wu-Song Huang, Martin Glodde, Wai-Kin Li, Sen Liu, Libor Vyklicky | 2016-10-11 |
| 9389516 | Resist performance for the negative tone develop organic development process | Luisa D. Bozano, Linda Karin Sundberg, Hoa D. Truong, HsinYu Tsai, Gregory M. Walraff | 2016-07-12 |
| 9182686 | Extreme ultraviolet radiation (EUV) pellicle formation apparatus | — | 2015-11-10 |
| 9069245 | Near-infrared absorptive layer-forming composition and multilayer film | Masaki Ohashi, Seiichiro Tachibana, Kazumi Noda, Shozo Shirai, Takeshi Kinsho +3 more | 2015-06-30 |
| 9057960 | Resist performance for the negative tone develop organic development process | Luisa D. Bozano, Linda Karin Sundberg, Hoa D. Truong, HsinYu Tsai, Gregory Michael Wallraff | 2015-06-16 |
| 9057957 | Extreme ultraviolet (EUV) radiation pellicle formation method | — | 2015-06-16 |
| 9012133 | Removal of alkaline crystal defects in lithographic patterning | Javier Perez, Ranee W. Kwong, Libor Vyklicky | 2015-04-21 |
| 8828143 | Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid | John P. Simons, Kenneth McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope +1 more | 2014-09-09 |
| 8772376 | Near-infrared absorbing film compositions | Wu-Song Huang, Martin Glodde, Wai-Kin Li, Sen Liu, Libor Vyklicky | 2014-07-08 |
| 8722307 | Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer | Seiichiro Tachibana, Kazumi Noda, Masaki Ohashi, Takeshi Kinsho, Wu-Song Huang +2 more | 2014-05-13 |
| 8652762 | Organic graded spin on BARC compositions for high NA lithography | Libor Vyklicky, Sean D. Burns, David R. Medeiros, Daniel P. Sanders, Robert David Allen | 2014-02-18 |
| 8598018 | Forming an electrode having reduced corrosion and water decomposition on surface using a custom oxide layer | Ali Afzali-Azdakani, Shafaat Ahmed, Hariklia Deligianni, Stefan Harrer, Hongbo Peng +4 more | 2013-12-03 |