Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8467993 | Measurement tool monitoring using fleet measurement precision and tool matching precision analysis | Charles N. Archie, Andrew Brendler, Eric P. Solecky | 2013-06-18 |
| 8347741 | Specimen handling apparatus | Michael Hatzistergos, Jonathan Levy, Christopher M. Molella, Paul A. Ronsheim, Vincent Vazquez | 2013-01-08 |
| 8299584 | Alignment of wafers for 3D integration | Srinivasan Rangarajan, Michael J. Shapiro, Anthony K. Stamper, Huilong Zhu | 2012-10-30 |
| 7869002 | Reducing contamination in immersion lithography | Raschid J. Bezama, Dario L. Goldfarb, Kafal Lai | 2011-01-11 |
| 7807335 | Immersion lithography contamination gettering layer | Daniel A. Corliss, Dario Gil, Dario L. Goldfarb, Steven J. Holmes, David V. Horak +2 more | 2010-10-05 |
| 7787101 | Apparatus and method for reducing contamination in immersion lithography | Raschid J. Bezama, Dario L. Goldfarb, Kafai Lai, Xiao Hi Liu | 2010-08-31 |
| 7782445 | Reducing contamination in immersion lithography | Raschid J. Bezama, Dario L. Goldfarb, Kafal Lai | 2010-08-24 |
| 7645694 | Development or removal of block copolymer or PMMA-b-S-based resist using polar supercritical solvent | Matthew E. Colburn, Shahab Siddiqui | 2010-01-12 |
| 7569112 | Scanning probe apparatus with in-situ measurement probe tip cleaning capability | Lin Zhou | 2009-08-04 |
| 7535349 | Determining root cause for alarm in processing system | Stephen W. Goodrich, Joseph J. Mezzapelle, Lin Zhou | 2009-05-19 |
| 7446859 | Apparatus and method for reducing contamination in immersion lithography | Raschid J. Bezama, Dario L. Goldfarb, Kafai Lai | 2008-11-04 |
| 7407554 | Development or removal of block copolymer or PMMA-b-S-based resist using polar supercritical solvent | Matthew E. Colburn, Shahab Siddiqui | 2008-08-05 |