Issued Patents All Time
Showing 26–50 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7863712 | Hybrid orientation semiconductor structure with reduced boundary defects and method of forming same | Haizhou Yin, John A. Ott, Katherine L. Saenger | 2011-01-04 |
| 7833873 | Method and structure to reduce contact resistance on thin silicon-on-insulator device | Brian J. Greene, Louis L. Hsu, Jack A. Mandelman | 2010-11-16 |
| 7804148 | Opto-thermal mask including aligned thermal dissipative layer, reflective layer and transparent capping layer | Louis L. Hsu, Jack A. Mandelman, Chandrasekhar Narayan | 2010-09-28 |
| 7704852 | Amorphization/templated recrystallization method for hybrid orientation substrates | Keith E. Fogel, Katherine L. Saenger, Haizhou Yin | 2010-04-27 |
| 7691733 | Laser processing method for trench-edge-defect-free solid phase epitaxy in confined geometrics | Keith E. Fogel, Kam-Leung Lee, Katherine L. Saenger, Haizhou Yin | 2010-04-06 |
| 7687865 | Method and structure to reduce contact resistance on thin silicon-on-insulator device | Brian J. Greene, Louis L. Hsu, Jack A. Mandelman | 2010-03-30 |
| 7678622 | Semiconductor method and device with mixed orientation substrate | Jiang Yan, Danny Pak-Chum Shum, Alois Gutmann | 2010-03-16 |
| 7671421 | CMOS structure and method for fabrication thereof using multiple crystallographic orientations and gate materials | Tze-Chiang Chen, Meikei Ieong, Rajarao Jammy, Mukesh V. Khare, Richard S. Wise +2 more | 2010-03-02 |
| 7618857 | Method of reducing detrimental STI-induced stress in MOSFET channels | Meikei Leong, Qiqing C. Ouyang | 2009-11-17 |
| 7615816 | Buried plate structure for vertical dram devices | Kangguo Cheng, Ramachandra Divakaruni | 2009-11-10 |
| 7598147 | Method of forming CMOS with Si:C source/drain by laser melting and recrystallization | Yaocheng Liu, Qiqing C. Ouyang, Kathryn T. Schonenberg | 2009-10-06 |
| 7547616 | Laser processing method for trench-edge-defect-free solid phase epitaxy in confined geometrics | Keith E. Fogel, Kam-Leung Lee, Katherine L. Saenger, Haizhou Yin | 2009-06-16 |
| 7542330 | SRAM with asymmetrical pass gates | Brian J. Greene, Clement Wann, Robert C. Wong, Ying Zhang | 2009-06-02 |
| 7525162 | Orientation-optimized PFETS in CMOS devices employing dual stress liners | Haizhou Yin, Katherine L. Saenger, Kai Xiu | 2009-04-28 |
| 7479437 | Method to reduce contact resistance on thin silicon-on-insulator device | Brian J. Greene, Louis L. Hsu, Jack A. Mandelman | 2009-01-20 |
| 7465992 | Field effect transistor with mixed-crystal-orientation channel and source/drain regions | Joel P. Desouza, Devendra K. Sadana, Katherine L. Saenger, Min Yang, Haizhou Yin | 2008-12-16 |
| 7462525 | Enhancement of electron and hole mobilities in <110> Si under biaxial compressive strain | Victor Chan, Massimo V. Fischetti, John Michael Hergenrother, Meikei Ieong, Rajesh Rengarajan +3 more | 2008-12-09 |
| 7449374 | Methods of manufacturing semiconductor devices with rotated substrates | Matthias Hierlemann, Brian J. Greene, Manfred Eller | 2008-11-11 |
| 7410852 | Opto-thermal annealing methods for forming metal gate and fully silicided gate field effect transistors | Scott D. Allen, Cyril Cabral, Jr., Kevin K. Dezfulian, Sunfei Fang, Brian J. Greene +6 more | 2008-08-12 |
| 7396407 | Trench-edge-defect-free recrystallization by edge-angle-optimized solid phase epitaxy: method and applications to hybrid orientation substrates | Katherine L. Saenger, Haizhou Yin | 2008-07-08 |
| 7329939 | Metal-insulator-metal capacitor and method of fabricating same | Louis L. Hsu, Rajiv V. Joshi | 2008-02-12 |
| 7314790 | Enhancement of electron and hole mobilities in <110> Si under biaxial compressive strain | Victor Chan, Massimo V. Fischetti, John Michael Hergenrother, Meikei Ieong, Rajesh Rengarajan +3 more | 2008-01-01 |
| 7298009 | Semiconductor method and device with mixed orientation substrate | Jiang Yan, Danny Pak-Chum Shum, Alois Gutmann | 2007-11-20 |
| 7291539 | Amorphization/templated recrystallization method for hybrid orientation substrates | Keith E. Fogel, Katherine L. Saenger, Haizhou Yin | 2007-11-06 |
| 7247547 | Method of fabricating a field effect transistor having improved junctions | Huilong Zhu, Oleg Gluschenkov | 2007-07-24 |