| 8039331 |
Opto-thermal annealing methods for forming metal gate and fully silicided gate-field effect transistors |
Scott D. Allen, Cyril Cabral, Jr., Kevin K. Dezfulian, Sunfei Fang, Brian J. Greene +6 more |
2011-10-18 |
| 7791109 |
Metal silicide alloy local interconnect |
Haining Yang |
2010-09-07 |
| 7785999 |
Formation of fully silicided metal gate using dual self-aligned silicide process |
Cyril Cabral, Jr., Chester T. Dziobkowski, Sunfei Fang, Evgeni Gousev, Rajarao Jammy +4 more |
2010-08-31 |
| 7542330 |
SRAM with asymmetrical pass gates |
Brian J. Greene, Chun-Yung Sung, Robert C. Wong, Ying Zhang |
2009-06-02 |
| 7494915 |
Back end interconnect with a shaped interface |
Lawrence A. Clevenger, Andrew P. Cowley, Timothy J. Dalton, Mark Hoinkis, Steffen K. Kaldor +8 more |
2009-02-24 |
| 7410852 |
Opto-thermal annealing methods for forming metal gate and fully silicided gate field effect transistors |
Scott D. Allen, Cyril Cabral, Jr., Kevin K. Dezfulian, Sunfei Fang, Brian J. Greene +6 more |
2008-08-12 |
| 7282435 |
Method of forming contact for dual liner product |
Haining Yang, Huilong Zhu |
2007-10-16 |
| 7271455 |
Formation of fully silicided metal gate using dual self-aligned silicide process |
Cyril Cabral, Jr., Chester T. Dziobkowski, Sunfei Fang, Evgeni Gousev, Rajarao Jammy +4 more |
2007-09-18 |
| 7132322 |
Method for forming a SiGe or SiGeC gate selectively in a complementary MIS/MOS FET device |
Brian J. Greene, Kern Rim |
2006-11-07 |
| 7122462 |
Back end interconnect with a shaped interface |
Lawrence A. Clevenger, Andrew P. Cowley, Timothy J. Dalton, Mark Hoinkis, Steffen K. Kaldor +8 more |
2006-10-17 |
| 7122472 |
Method for forming self-aligned dual fully silicided gates in CMOS devices |
Sunfei Fang, Cyril Cabral, Jr., Chester T. Dziobkowski, Christian Lavoie |
2006-10-17 |
| 7112481 |
Method for forming self-aligned dual salicide in CMOS technologies |
Sunfei Fang, Cyril Cabral, Jr., Chester T. Dziobkowski, John J. Ellis-Monaghan, Christian Lavoie +3 more |
2006-09-26 |
| 7098536 |
Structure for strained channel field effect transistor pair having a member and a contact via |
Haining Yang, Huilong Zhu |
2006-08-29 |
| 7067368 |
Method for forming self-aligned dual salicide in CMOS technologies |
Sunfei Fang, Cyril Cabral, Jr., Chester T. Dziobkowski, John J. Ellis-Monaghan, Christian Lavoie +3 more |
2006-06-27 |
| 7064025 |
Method for forming self-aligned dual salicide in CMOS technologies |
Sunfei Fang, Cyril Cabral, Jr., Chester T. Dziobkowski, John J. Ellis-Monaghan, Christian Lavoie +3 more |
2006-06-20 |
| 6984564 |
Structure and method to improve SRAM stability without increasing cell area or off current |
Shih-Fen Huang, Haining Yang |
2006-01-10 |