SK

Steffen K. Kaldor

IBM: 11 patents #9,995 of 70,183Top 15%
Infineon Technologies Ag: 6 patents #1,452 of 7,486Top 20%
📍 Fishkill, NY: #78 of 387 inventorsTop 25%
🗺 New York: #13,384 of 115,490 inventorsTop 15%
Overall (All Time): #468,791 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
7494915 Back end interconnect with a shaped interface Lawrence A. Clevenger, Andrew P. Cowley, Timothy J. Dalton, Mark Hoinkis, Erdem Kaltalioglu +8 more 2009-02-24
7378338 Method of forming an interconnect structure diffusion barrier with high nitrogen content Cyril Cabral, Jr., Hyungjun Kim, Stephen M. Rossnagel 2008-05-27
7241681 Bilayered metal hardmasks for use in dual damascene etch schemes Kaushik A. Kumar, Lawrence A. Clevenger, Timothy J. Dalton, Douglas C. La Tulipe, Jr., Andy Cowley +5 more 2007-07-10
7241696 Method for depositing a metal layer on a semiconductor interconnect structure having a capping layer Larry Clevenger, Timothy J. Dalton, Mark Hoinkis, Kaushik A. Kumar, Douglas C. La Tulipe, Jr. +5 more 2007-07-10
7214548 Apparatus and method for flattening a warped substrate Mohammed Fazil Fayaz, Conal E. Murray, Ismail C. Noyan, Anne L. Petrosky 2007-05-08
7122462 Back end interconnect with a shaped interface Lawrence A. Clevenger, Andrew P. Cowley, Timothy J. Dalton, Mark Hoinkis, Erdem Kaltalioglu +8 more 2006-10-17
7098537 Interconnect structure diffusion barrier with high nitrogen content Cyril Cabral, Jr., Hyungjun Kim, Stephen M. Rossnagel 2006-08-29
7064064 Copper recess process with application to selective capping and electroless plating Shyng-Tsong Chen, Timothy J. Dalton, Kenneth M. Davis, Chao-Kun Hu, Fen F. Jamin +11 more 2006-06-20
7052621 Bilayered metal hardmasks for use in Dual Damascene etch schemes Kaushik A. Kumar, Lawrence A. Clevenger, Timothy J. Dalton, Douglas C. La Tulipe, Jr., Andy Cowley +5 more 2006-05-30
7001835 Crystallographic modification of hard mask properties Lawrence A. Clevenger, Andrew P. Cowley, Timothy J. Dalton, Mark Hoinkis, Kaushik A. Kumar +3 more 2006-02-21
6975032 Copper recess process with application to selective capping and electroless plating Shyng-Tsong Chen, Timothy J. Dalton, Kenneth M. Davis, Chao-Kun Hu, Fen F. Jamin +11 more 2005-12-13