Patent Leaderboard
USPTO Patent Rankings Data through Sept 30, 2025
AS

Anthony K. Stamper — 633 Patents

IBM: 462 patents #29 of 70,183Top 1%
Globalfoundries: 91 patents #17 of 4,424Top 1%
GUGlobalfoundries U.S.: 68 patents #5 of 665Top 1%
SCSmartsens Technology (Cayman) Co.: 3 patents #6 of 15Top 40%
GPGlobalfoundries Singapore Pte.: 3 patents #212 of 828Top 30%
WIWispry: 3 patents #12 of 52Top 25%
Infineon Technologies Ag: 2 patents #3,160 of 7,486Top 45%
ULUltratech: 1 patents #58 of 110Top 55%
IMInternational Machines: 1 patents #1 of 34Top 3%
ETElpis Technologies: 1 patents #31 of 121Top 30%
Burlington, VT: #1 of 475 inventorsTop 1%
Vermont: #1 of 4,968 inventorsTop 1%
Overall (All Time): #221 of 4,157,543Top 1%
633 Patents All Time

Issued Patents All Time

Showing 601–625 of 633 patents

Patent #TitleCo-InventorsDate
6436814 Interconnection structure and method for fabricating same David V. Horak, William A. Klaasen, Thomas L. McDevitt, Mark P. Murray 2002-08-20
6433429 Copper conductive line with redundant liner and method of making 2002-08-13
6429524 Ultra-thin tantalum nitride copper interconnect barrier Edward C. Cooney, III 2002-08-06
6426249 Buried metal dual damascene plate capacitor Robert M. Geffken 2002-07-30
6426558 Metallurgy for semiconductor devices Jonathan D. Chapple-Sokol, Paul M. Feeney, Robert M. Geffken, David V. Horak, Mark P. Murray 2002-07-30
6420254 Recessed bond pad Sally J. Yankee 2002-07-16
6403393 Device having integrated optical and copper conductors and method of fabricating same James W. Adkisson, Paul W. Pastel 2002-06-11
6384468 Capacitor and method for forming same Kerry Bernstein, Nicholas Theodore Schmidt, Stephen A. St. Onge, Steven H. Voldman 2002-05-07
6368903 SOI low capacitance body contact Andres Bryant, Randy W. Mann 2002-04-09
6362531 Recessed bond pad Sally J. Yankee 2002-03-26
6342733 Reduced electromigration and stressed induced migration of Cu wires by surface coating Chao-Kun Hu, Robert Rosenberg, Judith M. Rubino, Carlos J. Sambucetti 2002-01-29
6339022 Method of annealing copper metallurgy Arne Ballantine, Edward C. Cooney, III, George A. Dunbar, III, Cheryl G. Faltermeier, Jeffrey D. Gilbert +9 more 2002-01-15
6331481 Damascene etchback for low .epsilon. dielectric Vincent J. McGahay 2001-12-18
6319818 Pattern factor checkerboard for planarization 2001-11-20
6310300 Fluorine-free barrier layer between conductor and insulator for degradation prevention Edward C. Cooney, III, Hyun Koo Lee, Thomas L. McDevitt 2001-10-30
6303456 Method for making a finger capacitor with tuneable dielectric constant Wilbur D. Pricer 2001-10-16
6297149 Methods for forming metal interconnects 2001-10-02
6261895 Polysilicon capacitor having large capacitance and low resistance and process for forming the capacitor James W. Adkisson, John A. Bracchitta, Jed H. Rankin 2001-07-17
6261951 Plasma treatment to enhance inorganic dielectric adhesion to copper Leena Paivikki Buchwalter, Barbara Luther, Paul D. Agnello, John P. Hummel, Terence L. Kane +3 more 2001-07-17
6255217 Plasma treatment to enhance inorganic dielectric adhesion to copper Paul D. Agnello, Leena Paivikki Buchwalter, John P. Hummel, Barbara Luther 2001-07-03
6236103 Integrated high-performance decoupling capacitor and heat sink Kerry Bernstein, Robert M. Geffken, Wilbur D. Pricer, Steven H. Voldman 2001-05-22
6214730 Fluorine barrier layer between conductor and insulator for degradation prevention Edward C. Cooney, III, Hyun Koo Lee, Thomas L. McDevitt 2001-04-10
6111301 Interconnection with integrated corrosion stop 2000-08-29
6104079 Closely pitched polysilicon fuses and method of forming the same 2000-08-15
6066577 Method for providing fluorine barrier layer between conductor and insulator for degradation prevention Edward C. Cooney, III, Hyun Koo Lee, Thomas L. McDevitt 2000-05-23