Issued Patents All Time
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5392115 | Method of detecting inclination of a specimen and a projection exposure device as well as method of detecting period of periodically varying signal | Taku Ninomiya, Toshiei Kurosaki | 1995-02-21 |
| 5329333 | Exposure apparatus and method | Minori Noguchi, Yukio Kenbo, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama | 1994-07-12 |
| 5324953 | Reduced-projection exposure system with chromatic aberration correction system including diffractive lens such as holographic lens | Yasuhiro Yoshitake, Masataka Shiba, Yasuhiko Nakayama | 1994-06-28 |
| 5302999 | Illumination method, illumination apparatus and projection exposure apparatus | Tutomu Tawa, Yukihiro Shibata, Shigemi Ishii, Minori Noguchi, Tsuneo Terasawa +1 more | 1994-04-12 |
| 5247329 | Projection type exposure method and apparatus | Toshiei Kurosaki, Akira Inagaki, Yoshihiko Aiba | 1993-09-21 |
| 5227862 | Projection exposure apparatus and projection exposure method | Tetsuzo Tanimoto, Minoru Tanaka | 1993-07-13 |
| 5209813 | Lithographic apparatus and method | Genya Matsuoka, Teruo Iwasaki, Toshio Kaneko, Hiroyuki Takahashi, Hiroyoshi Ando +2 more | 1993-05-11 |
| 5164789 | Method and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interference | Yasuhiro Yoshitake, Soichi Katagiri, Shuji Sugiyama, Yoshimitsu Saze | 1992-11-17 |
| 5016149 | Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same | Minoru Tanaka, Yasuhiro Yoshitake, Tetsuzo Tanimoto | 1991-05-14 |
| 5008702 | Exposure method and apparatus | Tsutomu Tanaka, Masataka Shiba, Naoto Nakashima, Ryuichi Funatsu | 1991-04-16 |
| 4993837 | Method and apparatus for pattern detection | Yasuhiro Yoshitake, Naoto Nakashima, Masataka Shiba | 1991-02-19 |
| 4922290 | Semiconductor exposing system having apparatus for correcting change in wavelength of light source | Yasuhiro Yoshitake | 1990-05-01 |
| 4862008 | Method and apparatus for optical alignment of semiconductor by using a hologram | Naoto Nakashima, Yasuhiro Yoshitake | 1989-08-29 |
| 4819033 | Illumination apparatus for exposure | Yasuhiro Yoshitake, Masataka Shiba, Naoto Nakashima | 1989-04-04 |
| 4795261 | Reduction projection type aligner | Toshihiko Nakata, Masataka Shiba | 1989-01-03 |
| 4779986 | Reduction projection system alignment method and apparatus | Naoto Nakashima | 1988-10-25 |
| 4777374 | Pattern position detecting method and apparatus for detecting the position of an alignment direction of a wafer target pattern | Toshihiko Nakata, Masataka Shiba | 1988-10-11 |
| 4744666 | Alignment detection optical system of projection type aligner | Naoto Nakashima, Toshihiko Nakata | 1988-05-17 |
| 4725737 | Alignment method and apparatus for reduction projection type aligner | Toshihiko Nakata, Masataka Shiba, Sachio Uto, Atsuhiro Yoshizaki | 1988-02-16 |
| 4701050 | Semiconductor exposure apparatus and alignment method therefor | Masataka Shiba, Naoto Nakashima, Toshihiko Nakata, Sachio Uto | 1987-10-20 |
| 4676637 | Exposure apparatus with foreign particle detector | Sachio Uto, Masataka Shiba | 1987-06-30 |
| 4668089 | Exposure apparatus and method of aligning exposure mask with workpiece | Masataka Shiba, Toshihiko Nakata, Mitsuyoshi Koizumi, Naoto Nakashima | 1987-05-26 |
| 4564296 | Plate thickness measuring method and apparatus | Hiroshi Makihara, Nobuhiko Aoki | 1986-01-14 |
| 4553844 | Configuration detecting method and system | Yasuo Nakagawa, Kanji Ishige | 1985-11-19 |
| 4473750 | Three-dimensional shape measuring device | Yoichi Kawata, Shinobu Watanabe, Noboru Umehara, Kenichi Isoda | 1984-09-25 |