Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7342241 | Method and apparatus for electron-beam lithography | Yasuko Aoki, Tsutomu Tawa | 2008-03-11 |
| 5214493 | Reduction exposure apparatus with correction for alignment light having inhomogeneous intensity distribution | Shuji Sugiyama, Katsunori Onuki | 1993-05-25 |
| 5164789 | Method and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interference | Yasuhiro Yoshitake, Yoshitada Oshida, Soichi Katagiri, Shuji Sugiyama | 1992-11-17 |