| 5008702 |
Exposure method and apparatus |
Tsutomu Tanaka, Yoshitada Oshida, Masataka Shiba, Ryuichi Funatsu |
1991-04-16 |
| 4993837 |
Method and apparatus for pattern detection |
Yoshitada Oshida, Yasuhiro Yoshitake, Masataka Shiba |
1991-02-19 |
| 4862008 |
Method and apparatus for optical alignment of semiconductor by using a hologram |
Yoshitada Oshida, Yasuhiro Yoshitake |
1989-08-29 |
| 4819033 |
Illumination apparatus for exposure |
Yasuhiro Yoshitake, Yoshitada Oshida, Masataka Shiba |
1989-04-04 |
| 4779986 |
Reduction projection system alignment method and apparatus |
Yoshitada Oshida |
1988-10-25 |
| 4744666 |
Alignment detection optical system of projection type aligner |
Yoshitada Oshida, Toshihiko Nakata |
1988-05-17 |
| 4701050 |
Semiconductor exposure apparatus and alignment method therefor |
Yoshitada Oshida, Masataka Shiba, Toshihiko Nakata, Sachio Uto |
1987-10-20 |
| 4668089 |
Exposure apparatus and method of aligning exposure mask with workpiece |
Yoshitada Oshida, Masataka Shiba, Toshihiko Nakata, Mitsuyoshi Koizumi |
1987-05-26 |