KT

Kazue Takahashi

HI Hitachi: 56 patents #204 of 28,497Top 1%
The General Hospital: 2 patents #806 of 3,021Top 30%
HH Hitachi High-Technologies: 1 patents #1,282 of 1,917Top 70%
HC Hitachi Koki Co.: 1 patents #557 of 888Top 65%
📍 Ibaraki, MA: #1 of 4 inventorsTop 25%
Overall (All Time): #40,423 of 4,157,543Top 1%
59
Patents All Time

Issued Patents All Time

Showing 26–50 of 59 patents

Patent #TitleCo-InventorsDate
6618692 Remote diagnostic system and method for semiconductor manufacturing equipment Nobuo Tsumaki, Hideyuki Yamamoto 2003-09-09
6610171 Method of holding substrate and substrate holding system Naoyuki Tamura, Youichi Ito, Yoshifumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 2003-08-26
6610170 Method of holding substrate and substrate holding system Naoyuki Tamura, Youichi Ito, Yoshifumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 2003-08-26
6596551 Etching end point judging method, etching end point judging device, and insulating film etching method using these methods Tatehito Usui, Ken Yoshioka, Shoji Ikuhara, Kouji Nishihata, Tetsunori Kaji +1 more 2003-07-22
6558100 Vacuum processing apparatus and a vacuum processing system Hironobu Kawahara, Mitsuru Suehiro, Hideyuki Yamamoto, Katsuya Watanabe 2003-05-06
6544379 Method of holding substrate and substrate holding system Naoyuki Tamura, Youichi Ito, Yoshifumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 2003-04-08
6537012 Vacuum processing apparatus and a vacuum processing system Hironobu Kawahara, Mitsuru Suehiro, Hideyuki Yamamoto, Katsuya Watanabe 2003-03-25
6524428 Method of holding substrate and substrate holding system Naoyuki Tamura, Youichi Ito, Yoshifumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 2003-02-25
6506686 Plasma processing apparatus and plasma processing method Toshio Masuda, Ryoji Fukuyama, Tomoyuki Tamura 2003-01-14
6503364 Plasma processing apparatus Toshio Masuda, Tatehito Usui, Shigeru Shirayone, Mitsuru Suehiro 2003-01-07
6482747 Plasma treatment method and plasma treatment apparatus Saburo Kanai, Yoshiaki Satou, Takazumi Ishizu 2002-11-19
6413876 Method for plasma processing high-speed semiconductor circuits with increased yield Yutaka Ohmoto, Hironobu Kawahara, Ken Yoshioka, Saburou Kanai 2002-07-02
6336991 Method of holding substrate and substrate holding system Naoyuki Tamura, Youichi Ito, Yoshifumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 2002-01-08
6235146 Vacuum treatment system and its stage Masanori Kadotani, Saburo Kanai, Youichi Itou, Takashi Fujii, Hironobu Kawahara +2 more 2001-05-22
6221201 Method of holding substrate and substrate holding system Naoyuki Tamura, Youichi Ito, Yoshifumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 2001-04-24
6217705 Method of holding substrate and substrate holding system Naoyuki Tamura, Youichi Ito, Yoshitumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 2001-04-17
6186153 Plasma treatment method and manufacturing method of semiconductor device Hiroyuki Kitsunai, Nobuo Tsumaki, Shigeru Kakuta, Kazuo Nojiri 2001-02-13
6171438 Plasma processing apparatus and plasma processing method Toshio Masuda, Mitsuru Suehiro, Tetsunori Kaji, Saburo Kanai 2001-01-09
6048434 Substrate holding system including an electrostatic chuck Naoyuki Tamura, Youichi Ito, Yoshifumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 2000-04-11
5985035 Method of holding substrate and substrate holding system Naoyuki Tamura, Youichi Ito, Yoshifumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 1999-11-16
5961774 Method of holding substrate and substrate holding system Naoyuki Tamura, Youichi Ito, Yoshifumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 1999-10-05
5906684 Method of holding substrate and substrate holding system Naoyuki Tamura, Youichi Ito, Yoshifumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 1999-05-25
5895586 Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum Tetsunori Kaji, Saburo Kanai, Satoshi Ito, Ryoji Hamasaki, Tetsuo Ono +2 more 1999-04-20
5874012 Plasma processing apparatus and plasma processing method Saburo Kanai, Kouichi Okamura, Ryoji Hamasaki, Satoshi Ito 1999-02-23
5792304 Method of holding substrate and substrate holding system Naoyuki Tamura, Youichi Ito, Yoshifumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone 1998-08-11