Issued Patents All Time
Showing 26–50 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8632930 | Method and apparatus for performing dark field double dipole lithography (DDL) | Duan-Fu Stephen Hsu, Sangbong Park, Douglas Van Den Broeke | 2014-01-21 |
| 8495529 | Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography | Douglas Van Den Broeke | 2013-07-23 |
| 8391605 | Method and apparatus for performing model-based OPC for pattern decomposed features | Duan-Fu Stephen Hsu, Jung Chul Park, Douglas Van Den Broeke | 2013-03-05 |
| 8253923 | Optical imaging writer system | Thomas Laidig | 2012-08-28 |
| 8132130 | Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process | Duan-Fu Stephen Hsu, Douglas Van Den Broeke, Thomas Laidig | 2012-03-06 |
| 8122391 | Method, program product and apparatus for performing double exposure lithography | Duan-Fu Stephen Hsu, Douglas Van Den Broeke | 2012-02-21 |
| 8120753 | Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process | Gabriel Berger, Tamer Coskun, Sangbong Park | 2012-02-21 |
| 8111921 | Method and apparatus for performing model-based OPC for pattern decomposed features | Duan-Fu Stephen Hsu, Jung Chul Park, Douglas Van Den Broeke | 2012-02-07 |
| 8039180 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Kurt E. Wampler, Douglas Van Den Broeke | 2011-10-18 |
| 8040573 | Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration | Xuelong Shi, Douglas Van Den Broeke | 2011-10-18 |
| 7998355 | CPL mask and a method and program product for generating the same | Douglas Van Den Broeke, Kurt E. Wampler | 2011-08-16 |
| 7985515 | Method and apparatus for performing model-based layout conversion for use with dipole illumination | Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Noel Corcoran | 2011-07-26 |
| 7981576 | Method and apparatus for performing dark field double dipole lithography (DDL) | Duan-Fu Stephen Hsu, Sangbong Park, Douglas Van Den Broeke | 2011-07-19 |
| 7892707 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Kurt E. Wampler, Douglas Van Den Broeke | 2011-02-22 |
| 7892703 | CPL mask and a method and program product for generating the same | Duan-Fu Stephen Hsu, Douglas Van Den Broeke, Jung Chul Park, Thomas Laidig | 2011-02-22 |
| 7824826 | Method and apparatus for performing dark field double dipole lithography (DDL) | Duan-Fu Stephen Hsu, Sangbong Park, Douglas Van Den Broeke | 2010-11-02 |
| 7820341 | Method of two dimensional feature model calibration and optimization | Thomas Laidig, Xuelong Shi, Ralph Schlief, Uwe Hollerbach, Kurt E. Wampler | 2010-10-26 |
| 7818151 | Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool | Tamer Coskun, Sangbong Park, Bernd Geh | 2010-10-19 |
| 7804646 | Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings | Ting-Yin Chen | 2010-09-28 |
| 7774736 | Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography | Douglas Broeke, Thomas Laidig, Kurt E. Wampler, Stephen Hsu | 2010-08-10 |
| 7735052 | Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs | Xuelong Shi, Duan-Fu Stephen Hsu | 2010-06-08 |
| 7725872 | Orientation dependent shielding for use with dipole illumination techniques | Stephen Hsu, Noel Corcoran | 2010-05-25 |
| 7713667 | System and method for generating pattern data used to control a pattern generator | Azat Latypov, Arno Jan Bleeker, Kars Zeger Troost | 2010-05-11 |
| 7681171 | Method, program product and apparatus for performing double exposure lithography | Duan-Fu Stephen Hsu, Douglas Van Den Broeke | 2010-03-16 |
| 7667216 | Method of achieving CD linearity control for full-chip CPL manufacturing | Doug Van Den Broeke, Chungwei Hsu | 2010-02-23 |