CH

Chungwei Hsu

AB Asml Masktools B.V.: 2 patents #22 of 37Top 60%
NT Nanya Technology: 2 patents #292 of 775Top 40%
Overall (All Time): #1,241,946 of 4,157,543Top 30%
4
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7667216 Method of achieving CD linearity control for full-chip CPL manufacturing Doug Van Den Broeke, Jang Fung Chen 2010-02-23
7211815 Method of achieving CD linearity control for full-chip CPL manufacturing Doug Broeke, Jang Fung Chen 2007-05-01
6215546 Method of optical correction for improving the pattern shrinkage caused by scattering of the light Ronfu Chu, Quentin Chen, Jengping Lin 2001-04-10
6083807 Overlay measuring mark and its method 2000-07-04