Issued Patents All Time
Showing 51–75 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7666554 | Method and apparatus for performing model-based layout conversion for use with dipole illumination | Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Noel Corcoran | 2010-02-23 |
| 7652758 | Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems | Sangbong Park, Armin Liebchen | 2010-01-26 |
| 7639864 | Method, program product and apparatus for optimizing illumination for full-chip layer | Robert John Socha | 2009-12-29 |
| 7620930 | Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography | Douglas Van Den Broeke | 2009-11-17 |
| 7617476 | Method for performing pattern pitch-split decomposition utilizing anchoring features | Duan-Fu Stephen Hsu, Noel Corcoran, Douglas Van Den Broeke | 2009-11-10 |
| 7614034 | Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology | Douglas Van Den Broeke, Sangbong Park, Chung-Wei Hsu | 2009-11-03 |
| 7604909 | Method for improved manufacturability and patterning of sub-wavelength contact hole mask | Chung-Wei Hsu, Douglas Van Den Broeke | 2009-10-20 |
| 7594199 | Method of optical proximity correction design for contact hole mask | Robert John Socha, Xuelong Shi, Douglas Broeke | 2009-09-22 |
| 7550235 | Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography | Xuelong Shi, Thomas Laidig, Kurt E. Wampler, Douglas Van Den Broeke | 2009-06-23 |
| 7549140 | Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography | Doug Van Den Broeke, Thomas Laidig, Kurt E. Wampler, Stephen Hsu | 2009-06-16 |
| 7523438 | Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM | Michael S. Hsu, Stephen Hsu, Thomas Laidig, Douglas Van Den Broeke | 2009-04-21 |
| 7514183 | Method for performing transmission tuning of a mask pattern to improve process latitude | Stephen Hsu, Xuelong Shi, Douglas Van Den Broeke | 2009-04-07 |
| 7506299 | Feature optimization using interference mapping lithography | Robert John Socha, Xuelong Shi, Douglas Broeke | 2009-03-17 |
| 7494753 | Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation | Gabriel Berger, Tamer Coskun, Sangbong Park, Ting-Yin Chen | 2009-02-24 |
| 7485396 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Kurt E. Wampler, Douglas Van Den Broeke | 2009-02-03 |
| 7440082 | Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model | Xuelong Shi | 2008-10-21 |
| 7376930 | Method, program product and apparatus for generating assist features utilizing an image field map | Kurt E. Wampler, Douglas Van Den Broeke, Uwe Hollerbach, Xuelong Shi | 2008-05-20 |
| 7354681 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Kurt E. Wampler, Douglas Van Den Broeke | 2008-04-08 |
| 7342646 | Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model | Xuelong Shi | 2008-03-11 |
| RE40084 | Optical proximity correction | John S. Petersen | 2008-02-19 |
| 7247574 | Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography | Douglas Broeke, Thomas Laidig, Kurt E. Wampler, Stephen Hsu | 2007-07-24 |
| 7246342 | Orientation dependent shielding for use with dipole illumination techniques | Stephen Hsu, Noel Corcoran | 2007-07-17 |
| 7242459 | Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition model | Xuelong Shi | 2007-07-10 |
| 7211815 | Method of achieving CD linearity control for full-chip CPL manufacturing | Doug Broeke, Chungwei Hsu | 2007-05-01 |
| 7175940 | Method of two dimensional feature model calibration and optimization | Thomas Laidig, Xuelong Shi, Ralph Schlief, Uwe Hollerbach, Kurt E. Wampler | 2007-02-13 |