Issued Patents All Time
Showing 76–94 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7138212 | Method and apparatus for performing model-based layout conversion for use with dipole illumination | Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Noel Corcoran | 2006-11-21 |
| 7124395 | Automatic optical proximity correction (OPC) rule generation | Xuelong Shi | 2006-10-17 |
| 7116411 | Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems | Sangbong Park, Armin Liebchen | 2006-10-03 |
| 7100145 | Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs | Xuelong Shi, Duan-Fu Stephen Hsu | 2006-08-29 |
| 6951701 | Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM | Michael S. Hsu, Stephen Hsu, Thomas Laidig, Douglas Van Den Broeke | 2005-10-04 |
| 6920628 | Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique | Douglas Van Den Broeke | 2005-07-19 |
| 6915505 | Method and apparatus for performing rule-based gate shrink utilizing dipole illumination | Stephen Hsu, Noel Corcoran | 2005-07-05 |
| 6875545 | Method of removing assist features utilized to improve process latitude | Markus Franciscus Antonius Eurlings, Duan-Fu Stephen Hsu | 2005-04-05 |
| 6851103 | Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography | Doug Van Den Broeke, Thomas Laidig, Kurt E. Wampler, Stephen Hsu | 2005-02-01 |
| 6835510 | Hybrid phase-shift mask | Roger Caldwell, Thomas Laidig, Kurt E. Wampler | 2004-12-28 |
| 6792591 | Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs | Xuelong Shi, Duan-Fu Stephen Hsu | 2004-09-14 |
| 6623895 | Hybrid phase-shift mask | Roger Caldwell, Thomas Laidig, Kurt E. Wampler | 2003-09-23 |
| 6541167 | Optical proximity correction | John S. Petersen | 2003-04-01 |
| 6519760 | Method and apparatus for minimizing optical proximity effects | Xuelong Shi, Stephen Hsu | 2003-02-11 |
| 5821014 | Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a mask | Kurt E. Wampler, Thomas Laidig | 1998-10-13 |
| 5447810 | Masks for improved lithographic patterning for off-axis illumination lithography | James A. Matthews | 1995-09-05 |
| 5340700 | Method for improved lithographic patterning in a semiconductor fabrication process | James A. Matthews | 1994-08-23 |
| 5256505 | Lithographical mask for controlling the dimensions of resist patterns | James A. Matthews | 1993-10-26 |
| 5242770 | Mask for photolithography | James A. Matthews | 1993-09-07 |