Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11715667 | Thermal process chamber lid with backside pumping | Anqing Cui, Dien-Yeh Wu, Wei V. Tang, Bo Wang | 2023-08-01 |
| 11658218 | P-type dipole for p-FET | Yongjing Lin, Karla M Bernal Ramos, Shih Chung Chen, Lin Dong, Steven C. H. Hung +1 more | 2023-05-23 |
| 11646226 | Method of tuning film properties of metal nitride using plasma | Wenyi Liu, Wei V. Tang, Srinivas Gandikota, Yong Wu, Jianqiu GUO +2 more | 2023-05-09 |
| 11587936 | Low resistivity DRAM buried word line stack | Jacqueline S. Wrench, Yong Yang, Srinivas Gandikota, Annamalai Lakshmanan, Joung Joo Lee +2 more | 2023-02-21 |
| 11552177 | PMOS high-K metal gates | Srinivas Gandikota, Steven C. H. Hung, Mandyam Sriram, Jacqueline S. Wrench, Yong Yang | 2023-01-10 |
| 11488830 | Oxygen free deposition of platinum group metal films | Wei V. Tang, Seshadri Ganguli, Sang Ho Yu, Feng Q. Liu, Jeffrey W. Anthis +3 more | 2022-11-01 |
| 11476267 | Liner for V-NAND word line stack | Jacqueline S. Wrench, Yong Wu, Wei V. Tang, Srinivas Gandikota, Yongjing Lin +2 more | 2022-10-18 |
| 11437271 | Seamless gap fill | Srinivas Gandikota, Wei Liu | 2022-09-06 |
| 11417517 | Treatments to enhance material structures | Srinivas Gandikota, Jacqueline S. Wrench, Yong Yang, Steven C. H. Hung | 2022-08-16 |
| 11384432 | Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plate | Muhammad M. Rasheed, Srinivas Gandikota, Mario D. Sanchez, Guoqiang Jian, Deepak Jadhav +1 more | 2022-07-12 |
| 11359282 | Methods for forming impurity free metal alloy films | Geetika Bajaj, Darshan Thakare, Prerna Goradia, Robert Jan Visser, Jacqueline S. Wrench +1 more | 2022-06-14 |
| 11335591 | Thermal process chamber lid with backside pumping | Anqing Cui, Dien-Yeh Wu, Wei V. Tang, Bo Wang | 2022-05-17 |
| 11289579 | P-type dipole for p-FET | Yongjing Lin, Karla M Bernal Ramos, Shih Chung Chen, Lin Dong, Steven C. H. Hung +1 more | 2022-03-29 |
| 11245022 | Integrated dipole flow for transistor | Yongjing Lin, Karla M Bernal Ramos, Luping Li, Shih Chung Chen, Jacqueline S. Wrench +4 more | 2022-02-08 |
| 11171047 | Fluorine-doped nitride films for improved high-k reliability | Srinivas Gandikota, Steven C. H. Hung, Jacqueline S. Wrench, Yongjing Lin, Susmit Singha Roy +2 more | 2021-11-09 |
| 11101128 | Methods for gapfill in substrates | Wei Liu, Yuan-hui LO, Srinivas Gandikota, Jacqueline S. Wrench, Yongjing Lin +2 more | 2021-08-24 |
| 11075276 | Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors | Yongjing Lin, Shih Chung Chen, Naomi Yoshida, Lin Dong, Liqi Wu +5 more | 2021-07-27 |
| 11062900 | Method of reducing effective oxide thickness in a semiconductor structure | Luping Li, Shih Chung Chen, Kazuya Daito, Lin Dong, Zhebo Chen +1 more | 2021-07-13 |
| 11018009 | Tuning work function of p-metal work function films through vapor deposition | Guoqiang Jian, Wei V. Tang, Chi-Chou Lin, Paul F. Ma, Mei Chang +1 more | 2021-05-25 |
| 10991586 | In-situ tungsten deposition without barrier layer | Yong Wu, Wei V. Tang, Jianqiu GUO, Wenyi Liu, Jacqueline S. Wrench +3 more | 2021-04-27 |
| 10755947 | Methods of increasing selectivity for selective etch processes | Wenyu Zhang, Mario D. Sanchez, Guoqiang Jian, Wei V. Tang, Paul F. Ma | 2020-08-25 |
| 10665450 | Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum films | Paul F. Ma, Wei V. Tang, Wenyu Zhang, Shih Chung Chen, CHEN-HAN LIN +6 more | 2020-05-26 |
| 10636705 | High pressure annealing of metal gate structures | Yifei Wang, Kurtis Leschkies, Fei Wang, Xin Liu, Wei V. Tang +2 more | 2020-04-28 |
| 10407771 | Atomic layer deposition chamber with thermal lid | Anqing Cui, Faruk Gungor, Dien-Yeh Wu, Vikas Jangra, Muhammad M. Rasheed +6 more | 2019-09-10 |
| 10199230 | Methods for selective deposition of metal silicides via atomic layer deposition cycles | Seshadri Ganguli, Bhushan Zope, Xinyu Fu, Avgerinos V. Gelatos, Guoqiang Jian +1 more | 2019-02-05 |