WL

Wei Liu

Applied Materials: 42 patents #212 of 7,310Top 3%
IO Iqm Finland Oy: 5 patents #7 of 36Top 20%
RJ Rutgers, The State University Of New Jersey: 3 patents #255 of 1,498Top 20%
RC Remacro Technology Co.: 2 patents #5 of 14Top 40%
NT Nuvoton Technology: 1 patents #157 of 310Top 55%
SM Shanghai Huali Microelectronics: 1 patents #84 of 202Top 45%
SU Southeast University: 1 patents #257 of 873Top 30%
XC Xi'An Zhongxing New Software Co.: 1 patents #205 of 714Top 30%
EC Everdisplay Optronics (Shanghai) Co.: 1 patents #55 of 151Top 40%
JU Jiangnan University: 1 patents #442 of 1,321Top 35%
NU National Chung Cheng University: 1 patents #164 of 580Top 30%
📍 San Jose, CA: #633 of 32,062 inventorsTop 2%
🗺 California: #5,163 of 386,348 inventorsTop 2%
Overall (All Time): #34,127 of 4,157,543Top 1%
64
Patents All Time

Issued Patents All Time

Showing 26–50 of 64 patents

Patent #TitleCo-InventorsDate
9793938 Intermediate-frequency analogue-to-digital conversion device Yajuan Duan, Mengbi Lei, Xiangling Li, Guojun Zhang 2017-10-17
9012336 Method for conformal treatment of dielectric films using inductively coupled plasma Heng Pan, Matthew S. Rogers, Johanes F. Swenberg, Christopher S. Olsen, David Chu +1 more 2015-04-21
8999106 Apparatus and method for controlling edge performance in an inductively coupled plasma chamber Johanes F. Swenberg, Hanh Nguyen, Son T. Nguyen, Roger Curtis, Philip A. Bottini +1 more 2015-04-07
8871645 Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof Udayan Ganguly, Yoshita Yokota, Jing Tang, Sunderraj Thirupapuliyur, Christopher S. Olsen +6 more 2014-10-28
8722547 Etching high K dielectrics with high selectivity to oxide containing layers at elevated temperatures with BC13 based etch chemistries Radhika Mani, Nicolas Gani, Meihua Shen, Shashank Deshmukh 2014-05-13
8546273 Methods and apparatus for forming nitrogen-containing layers Malcolm J. Bevan, Johanes F. Swenberg, Son T. Nguyen, Jose Antonio Marin, Jian Li 2013-10-01
8501626 Methods for high temperature etching a high-K material gate structure Eiichi Matsusue, Meihua Shen, Shashank Deshmukh, Anh Phan, David Palagashvili +4 more 2013-08-06
8481433 Methods and apparatus for forming nitrogen-containing layers Malcolm J. Bevan, Johanes F. Swenberg, Son T. Nguyen, Jose Antonio Marin, Jian Li 2013-07-09
8137463 Dual zone gas injection nozzle Johanes S. Swenberg, Hanh Nguyen, Son T. Nguyen, Roger Curtis, Philip A. Bottini 2012-03-20
8062472 Method of correcting baseline skew by a novel motorized source coil assembly Johanes F. Swenberg, Hanh Nguyen, Son T. Nguyen, Roger Curtis, Philip A. Bottini 2011-11-22
7964512 Method for etching high dielectric constant materials Xikun Wang, Yan Du, Mei Shen 2011-06-21
7780862 Device and method for etching flash memory gate stacks comprising high-k dielectric Meihua Shen, Xikun Wang, Yan Du, Shashank Deshmukh 2010-08-24
7718081 Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes Jim Zhongyi He, Sang-Hoon Ahn, Meihua Shen, Hichem M'Saad, Wendy H. Yeh +1 more 2010-05-18
7605398 Apparatus of high dynamic-range CMOS image sensor and method thereof Oscal Tzyh-Chiang Chen, Hsiu-Fen Yeh 2009-10-20
7568276 Apparatus for producing an inductor Shitong Yang, Jianxiong Lin, Yanliang Li 2009-08-04
7498106 Method and apparatus for controlling etch processes during fabrication of semiconductor devices David Mui, Hiroki Sasano 2009-03-03
7482178 Chamber stability monitoring using an integrated metrology tool David Mui, Hiroki Sasano 2009-01-27
7368394 Etch methods to form anisotropic features for high aspect ratio applications Meihua Shen, Uwe Leucke, Guangxiang Jin, Xikun Wang, Scott Williams 2008-05-06
7262865 Method and apparatus for controlling a calibration cycle or a metrology tool David Mui, Hiroki Sasano 2007-08-28
7250373 Method and apparatus for etching material layers with high uniformity of a lateral etch rate across a substrate David Mui 2007-07-31
7250319 Method of fabricating quantum features Lawrence C. West 2007-07-31
7094613 Method for controlling accuracy and repeatability of an etch process David Mui, Hiroki Sasano 2006-08-22
7064078 Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme Jim Zhongyi He, Sang-Hoon Ahn, Meihua Shen, Hichem M'Saad, Wendy H. Yeh +1 more 2006-06-20
6960416 Method and apparatus for controlling etch processes during fabrication of semiconductor devices David Mui, Hiroki Sasano 2005-11-01
6924191 Method for fabricating a gate structure of a field effect transistor Thorsten Lill, David Mui, Christopher Dennis Bencher 2005-08-02