Issued Patents All Time
Showing 51–64 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6924088 | Method and system for realtime CD microloading control | David Mui, Shashank Deshmukh, Hiroki Sasano | 2005-08-02 |
| 6911399 | Method of controlling critical dimension microloading of photoresist trimming process by selective sidewall polymer deposition | David Mui | 2005-06-28 |
| 6858361 | Methodology for repeatable post etch CD in a production tool | David Mui, Hiroki Sasano | 2005-02-22 |
| 6849151 | Monitoring substrate processing by detecting reflectively diffracted light | Michael Barnes, John Holland, David Mui | 2005-02-01 |
| 6767824 | Method of fabricating a gate structure of a field effect transistor using an alpha-carbon mask | Padmapani Nallan, Ajay Kumar, Guangxiang Jin | 2004-07-27 |
| 6703315 | Method of providing a shallow trench in a deep-trench device | David Mui | 2004-03-09 |
| 6677242 | Integrated shallow trench isolation approach | Scott Williams, Stephen Yuen, David Mui | 2004-01-13 |
| 6589879 | Nitride open etch process based on trifluoromethane and sulfur hexafluoride | Scott Williams, David Mui | 2003-07-08 |
| 6566270 | Integration of silicon etch and chamber cleaning processes | Scott Williams, Stephen Yuen, David Mui, Meihua Shen | 2003-05-20 |
| 6491835 | Metal mask etching of silicon | Ajay Kumar, Anisul Khan, John Chao, Jeff Chinn | 2002-12-10 |
| 6458671 | Method of providing a shallow trench in a deep-trench device | David Mui | 2002-10-01 |
| 6380095 | Silicon trench etch using silicon-containing precursors to reduce or avoid mask erosion | Yiqiong Wang, Maocheng Li, Anisul Khan, Shaoher X. Pan, Dragan Podlesnik | 2002-04-30 |
| 6235643 | Method for etching a trench having rounded top and bottom corners in a silicon substrate | David Mui, Dragan Podlesnik, Gene Lee, Nam Hun Kim, Jeff Chinn | 2001-05-22 |
| 6180533 | Method for etching a trench having rounded top corners in a silicon substrate | Alok Jain, Michelle Low, Gang Zou, David Mui, Dragan Podlesnik | 2001-01-30 |