Issued Patents All Time
Showing 51–75 of 82 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6302964 | One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system | Salvador P. Umotoy, Anh N. Nguyen, Steve H. Chiao | 2001-10-16 |
| 6296712 | Chemical vapor deposition hardware and process | Xin Sheng Guo, Mohan K. Bhan, Justin Jones, Russell C. Ellwanger, Mei Chang +2 more | 2001-10-02 |
| 6277199 | Chamber design for modular manufacturing and flexible onsite servicing | Son Trinh | 2001-08-21 |
| 6223447 | Fastening device for a purge ring | Joseph Yudovsky, Salvador P. Umotoy, Ronald L. Rose | 2001-05-01 |
| 6206971 | Integrated temperature controlled exhaust and cold trap assembly | Salvador P. Umotoy, Russell C. Ellwanger, Ronald L. Rose, Joel M. Huston, James Jin-Long Chen | 2001-03-27 |
| 6159299 | Wafer pedestal with a purge ring | Keith Kuang-Kuo Koai, Russell C. Ellwanger | 2000-12-12 |
| 6106625 | Reactor useful for chemical vapor deposition of titanium nitride | Keith Kuang-Kuo Koai, Mark S. Johnson, Mei Chang | 2000-08-22 |
| 6103014 | Chemical vapor deposition chamber | Ilya Perlov, Karl A. Littau, Alan F. Morrison, Mei Chang, Ashok Sinha | 2000-08-15 |
| 6096135 | Method and apparatus for reducing contamination of a substrate in a substrate processing system | Xin Sheng Guo, Shin-Hung Li | 2000-08-01 |
| 6086677 | Dual gas faceplate for a showerhead in a semiconductor wafer processing system | Salvador P. Umotoy, Anh N. Nguyen, Steve H. Chiao | 2000-07-11 |
| 6083321 | Fluid delivery system and method | Son Trihn, Joel M. Huston | 2000-07-04 |
| 6063440 | Method for aligning a wafer | Ling Chen, Joseph Yudovsky, Ying Yu | 2000-05-16 |
| 6063441 | Processing chamber and method for confining plasma | Keith Kuang-Kuo Koai, Mei Chang, Mark S. Johnson | 2000-05-16 |
| 6050446 | Pivoting lid assembly for a chamber | Son Trinh, Gwo-Chuan Tzu, Mark S. Johnson | 2000-04-18 |
| 5968276 | Heat exchange passage connection | Son Trinh, Mark S. Johnson | 1999-10-19 |
| 5935338 | Chemical vapor deposition chamber | Ilya Perlov, Karl A. Littau, Alan F. Morrison, Mei Chang, Ashok Sinha | 1999-08-10 |
| 5888304 | Heater with shadow ring and purge above wafer surface | Salvador P. Umotoy, Alan F. Morrison, Karl A. Littau, Richard A. Marsh, Dale R. DuBois | 1999-03-30 |
| 5882419 | Chemical vapor deposition chamber | Ashok Sinha, Mei Chang, Ilya Perlov, Karl A. Littau, Alan F. Morrison | 1999-03-16 |
| 5856240 | Chemical vapor deposition of a thin film onto a substrate | Ashok Sinha, Mei Chang, Ilya Perlov, Karl A. Littau, Alan F. Morrison | 1999-01-05 |
| 5810936 | Plasma-inert cover and plasma cleaning process and apparatus employing same | Cissy Leung, Sasson Somekh | 1998-09-22 |
| 5800686 | Chemical vapor deposition chamber with substrate edge protection | Karl A. Littau | 1998-09-01 |
| 5766365 | Removable ring for controlling edge deposition in substrate processing apparatus | Salvador P. Umotoy, Alan F. Morrison, Karl A. Littau, Richard A. Marsh | 1998-06-16 |
| 5705080 | Plasma-inert cover and plasma cleaning process | Cissy Leung, Sasson Somekh | 1998-01-06 |
| 5695568 | Chemical vapor deposition chamber | Ashok Sinha, Mei Chang, Ilya Perlov, Karl A. Littau, Alan F. Morrison | 1997-12-09 |
| 5556476 | Controlling edge deposition on semiconductor substrates | Cissy Leung | 1996-09-17 |