Issued Patents All Time
Showing 26–50 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7605083 | Formation of composite tungsten films | Ken Kaung Lai, Frederick Wu, Ramanujapuran A. Srinivas, Avgerinos V. Gelatos, Mei Chang +7 more | 2009-10-20 |
| 7501343 | Formation of boride barrier layers using chemisorption techniques | Alfred Mak | 2009-03-10 |
| 7501344 | Formation of boride barrier layers using chemisorption techniques | Alfred Mak | 2009-03-10 |
| 7485556 | Forming metal silicide on silicon-containing features of a substrate | Jianxin Lei, Lisa Yang, Hien Minh Le | 2009-02-03 |
| 7465666 | Method for forming tungsten materials during vapor deposition processes | Moris Kori, Alfred Mak, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more | 2008-12-16 |
| 7405158 | Methods for depositing tungsten layers employing atomic layer deposition techniques | Ken Kaung Lai, Ravi Rajagopalan, Amit Khandelwal, Madhu Moorthy, Srinivas Gandikota +9 more | 2008-07-29 |
| 7384867 | Formation of composite tungsten films | Ken Kaung Lai, Frederick Wu, Ramanujapuran A. Srinivas, Avgerinos V. Gelatos, Mei Chang +7 more | 2008-06-10 |
| 7294588 | In-situ-etch-assisted HDP deposition | M. Ziaul Karim, Dongqing Li, Thanh Pham | 2007-11-13 |
| 7238552 | Method and apparatus for depositing tungsten after surface treatment to improve film characteristics | — | 2007-07-03 |
| 7235486 | Method for forming tungsten materials during vapor deposition processes | Moris Kori, Alfred Mak, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more | 2007-06-26 |
| 7208413 | Formation of boride barrier layers using chemisorption techniques | Alfred Mak | 2007-04-24 |
| 7115494 | Method and system for controlling the presence of fluorine in refractory metal layers | Ashok Sinha, Ming Xi, Moris Kori, Alfred Mak, Lawrence Chung-Lai Lei +1 more | 2006-10-03 |
| 7085616 | Atomic layer deposition apparatus | Barry Chin, Alfred Mak, Lawrence Chung-Lai Lei, Ming Xi, Hua Chung +1 more | 2006-08-01 |
| 7049211 | In-situ-etch-assisted HDP deposition using SiF4 | M. Ziaul Karim, Dongqing Li, Thanh Pham | 2006-05-23 |
| 7033922 | Method and system for controlling the presence of fluorine in refractory metal layers | Moris Kori, Alfred Mak, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more | 2006-04-25 |
| 7033945 | Gap filling with a composite layer | Zheng Yuan, Shankar Venkataraman, M. Ziaul Karim, Thanh Pham, Ellie Yieh | 2006-04-25 |
| 6939804 | Formation of composite tungsten films | Ken Kaung Lai, Frederick Wu, Ramanujapuran A. Srinivas, Avgerinos V. Gelatos, Mei Chang +7 more | 2005-09-06 |
| 6936538 | Method and apparatus for depositing tungsten after surface treatment to improve film characteristics | — | 2005-08-30 |
| 6903031 | In-situ-etch-assisted HDP deposition using SiF4 and hydrogen | M. Ziaul Karim, Dongqing Li, Thanh Pham | 2005-06-07 |
| 6855368 | Method and system for controlling the presence of fluorine in refractory metal layers | Moris Kori, Alfred Mak, Lawrence Chung-Lai Lei, Hua Chung | 2005-02-15 |
| 6849545 | System and method to form a composite film stack utilizing sequential deposition techniques | Alfred Mak, Mei Chang, Hua Chung, Ashok Sinha, Moris Kori | 2005-02-01 |
| 6831004 | Formation of boride barrier layers using chemisorption techniques | Alfred Mak | 2004-12-14 |
| 6620723 | Formation of boride barrier layers using chemisorption techniques | Alfred Mak | 2003-09-16 |
| 6551929 | Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques | Moris Kori, Alfred Mak, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more | 2003-04-22 |
| 6221762 | Method for fabricating semiconductor device having improved step coverage and low resistivity contacts | Byung-Hak Lee | 2001-04-24 |