Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6270687 | RF plasma method | Yan Ye, Donald Olgado, Avi Tepman, Gerald Yin, Peter Loewenhardt +2 more | 2001-08-07 |
| 6248250 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Hiroji Hanawa, Gerald Yin, Philip M. Saizman, Peter Loewenhardt, Allen Zhao | 2001-06-19 |
| 6189484 | Plasma reactor having a helicon wave high density plasma source | Gerald Yin, Chii Guang Lee, Arnold Kholodenko, Peter Loewenhardt, Hongching Shan +1 more | 2001-02-20 |
| 6153530 | Post-etch treatment of plasma-etched feature surfaces to prevent corrosion | Yan Ye, Xiaoye Zhao, Chang-Lin Hsieh, Xian-Can Deng, Wen-Chiang Tu +1 more | 2000-11-28 |
| 6143476 | Method for high temperature etching of patterned layers using an organic mask stack | Yan Ye, Allen Zhao, Peter Hsieh | 2000-11-07 |
| 6123791 | Ceramic composition for an apparatus and method for processing a substrate | Nianci Han, Hong Shih, Jie Yuan, Danny Lu | 2000-09-26 |
| 6080529 | Method of etching patterned layers useful as masking during subsequent etching or for damascene structures | Yan Ye, Pavel Ionov, Allen Zhao, Peter Hsieh, Chun Yan +1 more | 2000-06-27 |
| 6071372 | RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls | Yan Ye, Donald Olgado, Avi Tepman, Gerald Yin, Peter Loewenhardt +2 more | 2000-06-06 |
| 6020686 | Inductively and multi-capacitively coupled plasma reactor | Yan Ye, Hiroji Hanawa, Gerald Yin | 2000-02-01 |
| 6010603 | Patterned copper etch for micron and submicron features, using enhanced physical bombardment | Yan Ye, Gerald Yin | 2000-01-04 |
| 6008140 | Copper etch using HCI and HBr chemistry | Yan Ye, Allen Zhao, Xiancan Deng | 1999-12-28 |
| 5968847 | Process for copper etch back | Yan Ye | 1999-10-19 |
| 5891348 | Process gas focusing apparatus and method | Yan Ye, Gerald Yin, Steve S. Y. Mak | 1999-04-06 |
| 5817534 | RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers | Yan Ye, Hiroji Hanawa, Gerald Yin, Peter Loewenhardt, Donald Olgado +2 more | 1998-10-06 |
| 5783101 | High etch rate residue free metal etch process with low frequency high power inductive coupled plasma | Gerald Yin, Hiroji Hanawa | 1998-07-21 |
| 5779926 | Plasma process for etching multicomponent alloys | Daisuke Tajima, Allen Zhao, Peter Loewenhardt, Timothy Webb | 1998-07-14 |
| 5777289 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Hiroji Hanawa, Gerald Yin, Philip M. Salzman, Peter Loewenhardt, Allen Zhao | 1998-07-07 |
| 5756400 | Method and apparatus for cleaning by-products from plasma chamber surfaces | Yan Ye, Gerald Yin, Keshav Prasad, Mark Siegel, Steve S. Y. Mak +3 more | 1998-05-26 |
| 5710486 | Inductively and multi-capacitively coupled plasma reactor | Yan Ye, Hiroji Hanawa, Gerald Yin | 1998-01-20 |