Issued Patents All Time
Showing 26–50 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9040816 | Methods and apparatus for forming photovoltaic cells using electrospray | — | 2015-05-26 |
| 8624857 | Haptics effect controller architecture and instruction set | Hugo Cheung | 2014-01-07 |
| 8112620 | Method and system for discovery of a root file system | Olaf Manczak, Christopher A. Vick | 2012-02-07 |
| 6809809 | Optical method and apparatus for inspecting large area planar objects | Patrick Kinney, Nagaraja Rao | 2004-10-26 |
| 6638886 | Plasma fluorine resistant alumina ceramic material and method of making | Tirunelveli S. Ravi | 2003-10-28 |
| 6465043 | Method and apparatus for reducing particle contamination in a substrate processing chamber | — | 2002-10-15 |
| 6449521 | Decontamination of a plasma reactor using a plasma after a chamber clean | — | 2002-09-10 |
| 6374770 | Apparatus for improving film stability of halogen-doped silicon oxide films | Peter Wai-Man Lee, Stuardo Robles, Virendra V. Rana, Amrita Verma | 2002-04-23 |
| 6291028 | Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface | Virendra V. Rana, Amrita Verma, Mohan K. Bhan, Sudhakar Subrahmanyam | 2001-09-18 |
| 6289843 | Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface | Virendra V. Rana, Amrita Verma, Mohan K. Bhan, Sudhakar Subrahmanyam | 2001-09-18 |
| 6223685 | Film to tie up loose fluorine in the chamber after a clean process | Mohan K. Bhan, Sudhakar Subrahmanyam | 2001-05-01 |
| 6214160 | Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers | Charles Dornfest, Gerald Girard | 2001-04-10 |
| 6191026 | Method for submicron gap filling on a semiconductor substrate | Virendra V. Rana, Andrew Conners, Xin Sheng Guo, Soonil Hong | 2001-02-20 |
| 6159333 | Substrate processing system configurable for deposition or cleaning | Srihari Ponnekanti, Gana A. Rimple, Laxman Murugesh | 2000-12-12 |
| 6139923 | Method and apparatus for reducing particle contamination in a substrate processing chamber | — | 2000-10-31 |
| 6125861 | Post-CMP wet-HF cleaning station | Chris Karlsrud, Periya Gopalan, Daniel Ray Trojan, Jeffrey Butler Cunnane, Jon MacErnie | 2000-10-03 |
| 6125789 | Increasing the sensitivity of an in-situ particle monitor | Vijay D. Parkhe | 2000-10-03 |
| 6121163 | Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface | Virendra V. Rana, Amrita Verma, Mohan K. Bhan, Sudhakar Subrahmanyam | 2000-09-19 |
| 6103601 | Method and apparatus for improving film stability of halogen-doped silicon oxide films | Peter Wai-Man Lee, Stuardo Robles, Virendra V. Rana, Amrita Verma | 2000-08-15 |
| 6090167 | Method and apparatus for improving film stability of halogen-doped silicon oxide films | Mohan K. Bhan, Sudhakar Subrahmanyam, Viren V. S. Rana | 2000-07-18 |
| 6083569 | Discharging a wafer after a plasma process for dielectric deposition | Majid K. Shahreza | 2000-07-04 |
| 6083451 | Method of producing a polycrystalline alumina ceramic which is resistant to a fluorine-comprising plasma | Tirunelveli S. Ravi | 2000-07-04 |
| 6029369 | Methods for spin drying a workpiece | Jose R. Gonzalez-Martin, Arthur Hamer | 2000-02-29 |
| 6020035 | Film to tie up loose fluorine in the chamber after a clean process | Mohan K. Bhan, Sudhakar Subrahmanyam | 2000-02-01 |
| 6001728 | Method and apparatus for improving film stability of halogen-doped silicon oxide films | Mohan K. Bhan, Sudhakar Subrahmanyam, Viren V. S. Rana | 1999-12-14 |