Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12377520 | Method and apparatus for insitu adjustment of wafer slip detection during work piece polishing | — | 2025-08-05 |
| 12217979 | Temperature controlled substrate carrier and polishing components | John Kevin Shugrue | 2025-02-04 |
| 12198935 | Atmospheric plasma in wafer processing system optimization | Robert C. Roberts | 2025-01-14 |
| 12145236 | Containment and exhaust system for substrate polishing components | John Kevin Shugrue | 2024-11-19 |
| 12023778 | Substrate carrier head and processing system | William Manfred Daschbach | 2024-07-02 |
| 11904431 | Method and apparatus for insitu adjustment of wafer slip detection during work piece polishing | — | 2024-02-20 |
| 11685012 | Planarized membrane and methods for substrate processing systems | — | 2023-06-27 |
| 11376705 | Chemical mechanical planarization carrier system | Richard Ciszek, Clifford Daniel | 2022-07-05 |
| 10315286 | Chemical mechanical planarization carrier system | Richard Ciszek, Clifford Daniel | 2019-06-11 |
| 9390903 | Method and apparatus for wafer backgrinding and edge trimming on one machine | Richard Ciszek, Clifford Daniel | 2016-07-12 |
| 8944887 | Apparatus and method for surface grinding and edge trimming workpieces | Richard Ciszek, Clifford Daniel | 2015-02-03 |
| 7540799 | System for adjusting an end effector relative to a workpiece | — | 2009-06-02 |
| 6923711 | Multizone carrier with process monitoring system for chemical-mechanical planarization tool | Thomas Laursen | 2005-08-02 |
| 6368183 | Wafer cleaning apparatus and associated wafer processing methods | Periya Gopalan, Jon MacErnie | 2002-04-09 |
| 6125861 | Post-CMP wet-HF cleaning station | Anand Gupta, Chris Karlsrud, Periya Gopalan, Jeffrey Butler Cunnane, Jon MacErnie | 2000-10-03 |
| 6116990 | Adjustable low profile gimbal system for chemical mechanical polishing | James R. Sinclair, Lawrence L. Lee | 2000-09-12 |
| 5899798 | Low profile, low hysteresis force feedback gimbal system for chemical mechanical polishing | Lawrence L. Lee | 1999-05-04 |