Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Atmospheric plasma in wafer processing system optimization

Atmospheric plasma in wafer processing system optimization

US Patent 12198935 · Granted Jan 14, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for insitu adjustment of wafer slip detection during work p2025
Temperature controlled substrate carrier and polishing components2025
Containment and exhaust system for substrate polishing components2024
Substrate carrier head and processing system2024
Method and apparatus for insitu adjustment of wafer slip detection during work p2024
Planarized membrane and methods for substrate processing systems2023
Chemical mechanical planarization carrier system2022
Chemical mechanical planarization carrier system2019
Method and apparatus for wafer backgrinding and edge trimming on one machine2016
Apparatus and method for surface grinding and edge trimming workpieces2015
Track system including a guardrail2013
Railway diamond crossing2010