Issued Patents All Time
Showing 51–69 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5954888 | Post-CMP wet-HF cleaning station | Chris Karlsrud, Periya Gopalan | 1999-09-21 |
| 5902494 | Method and apparatus for reducing particle generation by limiting DC bias spike | Stefan Wolff, Maria Galiano | 1999-05-11 |
| 5827785 | Method for improving film stability of fluorosilicate glass films | Mohan K. Bhan, Sudhakar Subrahmanyam, Virendra V. Rana | 1998-10-27 |
| 5824375 | Decontamination of a plasma reactor using a plasma after a chamber clean | — | 1998-10-20 |
| 5810937 | Using ceramic wafer to protect susceptor during cleaning of a processing chamber | Srihari Ponnekanti, Gana A. Rimple, Laxman Murugesh | 1998-09-22 |
| 5779807 | Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers | Charles Dornfest, Gerald Girard | 1998-07-14 |
| 5628870 | Method for marking a substrate using ionized gas | Yan Ye, Yuri S. Uritsky | 1997-05-13 |
| 5622565 | Reduction of contaminant buildup in semiconductor apparatus | Yan Ye, Shamouil Shamouliam | 1997-04-22 |
| 5622595 | Reducing particulate contamination during semiconductor device processing | Joseph Lanucha | 1997-04-22 |
| 5608155 | Method and apparatus for detecting particles on a substrate | Yan Ye | 1997-03-04 |
| 5578131 | Reduction of contaminant buildup in semiconductor processing apparatus | Yan Ye, Shamouil Shamouliam | 1996-11-26 |
| 5494523 | Controlling plasma particulates by contouring the plasma sheath using materials of differing RF impedances | Robert Steger, Charles S. Rhoades | 1996-02-27 |
| 5474640 | Apparatus for marking a substrate using ionized gas | Yan Ye, Yuri S. Uritsky | 1995-12-12 |
| 5456796 | Control of particle generation within a reaction chamber | Yan Ye, Joseph Lanucha | 1995-10-10 |
| 5427621 | Method for removing particulate contaminants by magnetic field spiking | — | 1995-06-27 |
| 5423918 | Method for reducing particulate contamination during plasma processing of semiconductor devices | Charles S. Rhoades, Yan Ye, Joseph Lanucha | 1995-06-13 |
| 5410122 | Use of electrostatic forces to reduce particle contamination in semiconductor plasma processing chambers | Yuh-Jia Su, Graham W. Hills, Joseph Lanucha | 1995-04-25 |
| 5328555 | Reducing particulate contamination during semiconductor device processing | — | 1994-07-12 |
| 5083865 | Particle monitor system and method | Patrick Kinney, Boris Fishkin, Jun Zhao, Robert K. Bendler | 1992-01-28 |