Issued Patents 2024
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12174545 | System and method for performing extreme ultraviolet photolithography processes | Tai-Yu Chen, Sagar Deepak Khivsara, Kuo-An Liu, Chieh Hsieh, Gwan Sin Chang +5 more | 2024-12-24 |
| 12167526 | Method and system for generating droplets for EUV photolithography processes | Yu-Kuang SUN, Cheng-Hao LAI, Yu-Huan Chen, Wei-Shin Cheng, Ming-Hsun Tsai +6 more | 2024-12-10 |
| 12167525 | EUV light source and apparatus for lithography | Po-Chung Cheng, Chia-Chen Chen, Jen-Yang Chung, Li-Jui Chen, Tzung-Chi Fu +1 more | 2024-12-10 |
| 12158701 | Particle removal device and method | Cheng-Hsuan Wu, Ming-Hsun Tsai, Li-Jui Chen, Heng-Hsin Liu | 2024-12-03 |
| 12130555 | Method and apparatus for mitigating contamination | Chih-Ping YEN, Yen-Shuo Su, Chieh Hsieh, Chun-Lin Chang, Li-Jui Chen +1 more | 2024-10-29 |
| 12119129 | EUV lithography apparatus | Cheng-Hung Tsai, Sheng-Kang Yu, Heng-Hsin Liu, Li-Jui Chen | 2024-10-15 |
| 12114411 | Apparatus and method for generating extreme ultraviolet radiation | Yu-Huan Chen, Yu-Chih Huang, Ming-Hsun Tsai, Heng-Hsin Liu | 2024-10-08 |
| 12111582 | Substrate stage and substrate processing system using the same | Yu-Huan Chen, Yu-Chih Huang, Ya-An PENG, Li-Jui Chen, Heng-Hsin Liu | 2024-10-08 |
| 12096544 | Lithography thermal control | Tai-Yu Chen, Cho-Ying Lin, Sagar Deepak Khivsara, Hsiang-Lin Chen, Chieh Hsieh +5 more | 2024-09-17 |
| 12096543 | Method for using radiation source apparatus | Chiao-Hua Cheng, Hsin-Feng Chen, Yu-Fa LO, Yu-Kuang SUN, Wei-Shin Cheng +7 more | 2024-09-17 |
| 12085585 | Particle image velocimetry of extreme ultraviolet lithography systems | En Hao Lai, Chi-Ming Yang, Li-Jui Chen, Po-Chung Cheng | 2024-09-10 |
| 12085860 | System and method for monitoring and controlling extreme ultraviolet photolithography processes | Tai-Yu Chen, Heng-Hsin Liu, Li-Jui Chen | 2024-09-10 |
| 12085865 | System and method for detecting debris in a photolithography system | Shih-Yu Tu, Chieh Hsieh, Li-Jui Chen, Heng-Hsin Liu | 2024-09-10 |
| 12078933 | System and method for omnidirectional real time detection of photolithography characteristics | Tai-Yu Chen, Sheng-Kang Yu, Li-Jui Chen, Heng-Hsin Liu | 2024-09-03 |
| 12066761 | Inspection tool for an extreme ultraviolet radiation source to observe tin residual | Chiao-Hua Cheng, Sheng-Kang Yu, Wei-Chun Yen, Heng-Hsin Liu, Ming-Hsun Tsai +7 more | 2024-08-20 |
| 12063734 | Droplet generator assembly and method of replacing components | Yu-Kuang SUN, Ming-Hsun Tsai, Wei-Shin Cheng, Cheng-Hao LAI, Hsin-Feng Chen +6 more | 2024-08-13 |
| 12061423 | Method and apparatus for mitigating tin debris | Cheng-Hung Tsai, Sheng-Kang Yu, Heng-Hsin Liu, Li-Jui Chen | 2024-08-13 |
| 12055864 | Droplet generator and method of servicing a photolithographic tool | Yu-Huan Chen, Cheng-Hsuan Wu, Ming-Hsun Tsai, Li-Jui Chen | 2024-08-06 |
| 12055867 | Lithography contamination control | Chieh Hsieh, Tai-Yu Chen, Cho-Ying Lin, Heng-Hsin Liu, Li-Jui Chen | 2024-08-06 |
| 12044975 | Extreme ultraviolet control system | Jen-Yang Chung, Chieh Hsieh, Li-Jui Chen, Po-Chung Cheng | 2024-07-23 |
| 12019378 | Methods of cleaning a lithography system | Cho-Ying Lin, Tai-Yu Chen, Chieh Hsieh, Sheng-Kang Yu, Li-Jui Chen +1 more | 2024-06-25 |
| 12007694 | Lithography apparatus and method | Wei-Chun Yen, Chi-Ming Yang, Sheng-Kang Yu, Li-Jui Chen, Heng-Hsin Liu | 2024-06-11 |
| 11948702 | Radiation source apparatus and method for using the same | Wei-Chung Tu, Sheng-Kang Yu, Li-Jui Chen, Heng-Hsin Liu | 2024-04-02 |
| 11921434 | Mask cleaning | Shu-Hao Chang, Norman Chen, Jeng-Horng Chen, Kuo-Chang Kau, Ming-Chin Chien +2 more | 2024-03-05 |
| 11906902 | Semiconductor processing tool and methods of operation | Tai-Yu Chen, Sheng-Kang Yu, Li-Jui Chen, Heng-Hsin Liu | 2024-02-20 |