Issued Patents 2019
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10518418 | Wafer swapper | Dale R. Du Bois, Karthik Janakiraman, Hari Ponnekanti, Sanjeev Baluja, Prajeeth Wilton | 2019-12-31 |
| 10497606 | Dual-zone heater for plasma processing | Xing Lin, Jianhua Zhou, Ramprakash Sankarakrishnan | 2019-12-03 |
| 10480077 | PEALD apparatus to enable rapid cycling | Dale R. Du Bois, Jianhua Zhou | 2019-11-19 |
| 10483141 | Semiconductor process equipment | Karthik Janakiraman, Hari Ponnekanti | 2019-11-19 |
| 10480074 | Apparatus for radical-based deposition of dielectric films | Jianhua Zhou, Yihong Chen, Abhijit Basu Mallick, Oscar Lopez, Ningli Liu | 2019-11-19 |
| 10460936 | Photo-assisted deposition of flowable films | Brian Saxton Underwood, Abhijit Basu Mallick, Mukund Srinivasan | 2019-10-29 |
| 10450653 | High impedance RF filter for heater with impedance tuning device | Jian J. Chen, Mohamad A. Ayoub, Zheng John Ye, Ramprakash Sankarakrishnan, Jianhua Zhou | 2019-10-22 |
| 10435786 | Alignment systems employing actuators providing relative displacement between lid assemblies of process chambers and substrates, and related methods | Danny D. WANG, Jun Tae Choi, Rupankar Choudhury, Zhong Qiang Hua, Jason Michael Lamb | 2019-10-08 |
| 10431480 | External substrate rotation in a semiconductor processing system | Tuan Nguyen, Amit Kumar BANSAL | 2019-10-01 |
| 10403535 | Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system | Zheng John Ye, Jay D. Pinson, II, Hiroji Hanawa, Jianhua Zhou, Xing Lin +11 more | 2019-09-03 |
| 10403515 | Loadlock integrated bevel etcher system | Saptarshi Basu, Jeongmin Lee, Paul Connors, Dale R. Du Bois, Prashant Kumar Kulshreshtha +12 more | 2019-09-03 |
| 10388549 | On-board metrology (OBM) design and implication in process tool | Khokan Chandra Paul, Jay D. Pinson, II, Hari Ponnekanti, Rupankar Choudhury, Shekhar ATHANI +2 more | 2019-08-20 |
| 10385448 | Apparatus and method for purging gaseous compounds | Amit Kumar BANSAL, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan | 2019-08-20 |
| 10325800 | High temperature electrostatic chucking with dielectric constant engineered in-situ charge trap materials | Prashant Kumar Kulshreshtha, Kwangduk Douglas Lee, Bok Hoen Kim, Zheng John Ye, Swayambhu Prasad Behera +2 more | 2019-06-18 |
| 10325799 | Dual temperature heater | Dale R. Du Bois, Sanjeev Baluja, Ganesh Balasubramanian, Lipyeow Yap, Jianhua Zhou +1 more | 2019-06-18 |
| 10276353 | Dual-channel showerhead for formation of film stacks | Kaushik Alayavalli, Xinhai Han, Praket P. Jha, Masaki Ogata, Zhijun Jiang +6 more | 2019-04-30 |
| 10266943 | Plasma corrosion resistive heater for high temperature processing | Abdul Aziz Khaja, Ren-Guan Duan, Amit Kumar BANSAL, Jianhua Zhou | 2019-04-23 |
| 10233543 | Showerhead assembly with multiple fluid delivery zones | Amit Kumar BANSAL, Sanjeev Baluja, Sam Kim, Tuan Nguyen | 2019-03-19 |
| 10236197 | Processing system containing an isolation region separating a deposition chamber from a treatment chamber | Karthik Janakiraman, Abhijit Basu Mallick, Hari Ponnekanti, Mandyam Sriram, Alexandros T. Demos +2 more | 2019-03-19 |
| 10192717 | Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates | Abdul Aziz Khaja, Mohamad A. Ayoub, Jay D. Pinson, II | 2019-01-29 |