| 10504727 |
Thick tungsten hardmask films deposition on high compressive/tensile bow wafers |
Jiarui Wang, Eswaranand Venkatasubramanian, Susmit Singha Roy, Kwangduk Douglas Lee |
2019-12-10 |
| 10418243 |
Ultra-high modulus and etch selectivity boron-carbon hardmask films |
Ziqing Duan, Karthik Thimmavajjula Narasimha, Kwangduk Douglas Lee, Bok Hoen Kim |
2019-09-17 |
| 10403515 |
Loadlock integrated bevel etcher system |
Saptarshi Basu, Jeongmin Lee, Paul Connors, Dale R. Du Bois, Karthik Thimmavajjula Narasimha +12 more |
2019-09-03 |
| 10403535 |
Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system |
Zheng John Ye, Jay D. Pinson, II, Hiroji Hanawa, Jianhua Zhou, Xing Lin +11 more |
2019-09-03 |
| 10373822 |
Gas flow profile modulated control of overlay in plasma CVD films |
Sudha Rathi, Praket P. Jha, Saptarshi Basu, Kwangduk Douglas Lee, Martin Jay Seamons +5 more |
2019-08-06 |
| 10325800 |
High temperature electrostatic chucking with dielectric constant engineered in-situ charge trap materials |
Kwangduk Douglas Lee, Bok Hoen Kim, Zheng John Ye, Swayambhu Prasad Behera, Ganesh Balasubramanian +2 more |
2019-06-18 |
