KL

Kwangduk Douglas Lee

Applied Materials: 8 patents #37 of 1,241Top 3%
VA Varian Semiconductor Equipment Associates: 1 patents #57 of 161Top 40%
📍 Redwood City, CA: #19 of 1,104 inventorsTop 2%
🗺 California: #1,582 of 67,890 inventorsTop 3%
Overall (2019): #10,738 of 560,194Top 2%
9
Patents 2019

Issued Patents 2019

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
10510518 Methods of dry stripping boron-carbon films Sudha Rathi, Ramprakash Sankarakrishnan, Martin Jay Seamons, Irfan Jamil, Bok Hoen Kim 2019-12-17
10504727 Thick tungsten hardmask films deposition on high compressive/tensile bow wafers Jiarui Wang, Prashant Kumar Kulshreshtha, Eswaranand Venkatasubramanian, Susmit Singha Roy 2019-12-10
10418243 Ultra-high modulus and etch selectivity boron-carbon hardmask films Prashant Kumar Kulshreshtha, Ziqing Duan, Karthik Thimmavajjula Narasimha, Bok Hoen Kim 2019-09-17
10403515 Loadlock integrated bevel etcher system Saptarshi Basu, Jeongmin Lee, Paul Connors, Dale R. Du Bois, Prashant Kumar Kulshreshtha +12 more 2019-09-03
10403535 Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system Zheng John Ye, Jay D. Pinson, II, Hiroji Hanawa, Jianhua Zhou, Xing Lin +11 more 2019-09-03
10373822 Gas flow profile modulated control of overlay in plasma CVD films Prashant Kumar Kulshreshtha, Sudha Rathi, Praket P. Jha, Saptarshi Basu, Martin Jay Seamons +5 more 2019-08-06
10354875 Techniques for improved removal of sacrificial mask Rajesh Prasad, Ning Zhan, Tzu-Yu Liu, James Cournoyer, Kyu-Ha Shim +4 more 2019-07-16
10325800 High temperature electrostatic chucking with dielectric constant engineered in-situ charge trap materials Prashant Kumar Kulshreshtha, Bok Hoen Kim, Zheng John Ye, Swayambhu Prasad Behera, Ganesh Balasubramanian +2 more 2019-06-18
10236225 Method for PECVD overlay improvement Yoichi Suzuki, Michael Wenyoung Tsiang, Takashi Morii, Yuta GOTO 2019-03-19