| 10438860 |
Dynamic wafer leveling/tilting/swiveling steps for use during a chemical vapor deposition process |
Juan Carlos Rocha, Karthik Janakiraman, Tuan Nguyen |
2019-10-08 |
| 10431480 |
External substrate rotation in a semiconductor processing system |
Tuan Nguyen, Juan Carlos Rocha-Alvarez |
2019-10-01 |
| 10385448 |
Apparatus and method for purging gaseous compounds |
Juan Carlos Rocha-Alvarez, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan |
2019-08-20 |
| 10388121 |
Method for providing notifications |
Ayushi GUPTA, Prantik Banerjee, Theophilus Thomas, Kyoungwoon Hahm, Arun Prabhakar +18 more |
2019-08-20 |
| 10347465 |
Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber |
Mohamad A. Ayoub, Jian J. Chen |
2019-07-09 |
| 10276353 |
Dual-channel showerhead for formation of film stacks |
Kaushik Alayavalli, Xinhai Han, Praket P. Jha, Masaki Ogata, Zhijun Jiang +6 more |
2019-04-30 |
| 10266943 |
Plasma corrosion resistive heater for high temperature processing |
Abdul Aziz Khaja, Ren-Guan Duan, Jianhua Zhou, Juan Carlos Rocha-Alvarez |
2019-04-23 |
| 10233543 |
Showerhead assembly with multiple fluid delivery zones |
Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Sam Kim, Tuan Nguyen |
2019-03-19 |
| 10227695 |
Shadow ring for modifying wafer edge and bevel deposition |
Dale R. Du Bois, Mohamad A. Ayoub, Robert W. Kim, Mark Fodor, Binh Nguyen +6 more |
2019-03-12 |
