| 9852916 |
Single platform, multiple cycle spacer deposition and etch |
Hao Chen, Chentsau Ying, Ellie Yieh |
2017-12-26 |
| 9847289 |
Protective via cap for improved interconnect performance |
Mehul Naik, Paul F. Ma |
2017-12-19 |
| 9847252 |
Methods for forming 2-dimensional self-aligned vias |
Bencherki Mebarki, Mehul Naik |
2017-12-19 |
| 9829790 |
Immersion field guided exposure and post-exposure bake process |
Douglas A. Buchberger, Jr., Sang Ki Nam, Viachslav Babayan, Christine Y Ouyang, Ludovic Godet |
2017-11-28 |
| 9777378 |
Advanced process flow for high quality FCVD films |
Erica Chen, Ludovic Godet, Jun Xue, Ellie Yieh |
2017-10-03 |
| 9773675 |
3D material modification for advanced processing |
Ludovic Godet, Erica Chen, Jun Xue, Ellie Yieh, Gary E. Dickerson |
2017-09-26 |
| 9754791 |
Selective deposition utilizing masks and directional plasma treatment |
Ludovic Godet, Yin Fan, Ellie Yieh |
2017-09-05 |
| 9748366 |
Etching oxide-nitride stacks using C4F6H2 |
Jong Mun Kim, Kenny L. Doan, Li Ling, Jairaj Payyapilly, Daisuke Shimizu +1 more |
2017-08-29 |
| 9748148 |
Localized stress modulation for overlay and EPE |
Ellie Yieh, Huixiong Dai, Ludovic Godet, Christopher Dennis Bencher |
2017-08-29 |
| 9721807 |
Cyclic spacer etching process with improved profile control |
Qingjun Zhou, Jungmin Ko, Tom Choi, Sean S. Kang, Jeremiah T. Pender +1 more |
2017-08-01 |
| 9716005 |
Plasma poisoning to enable selective deposition |
Ludovic Godet, Tobin Kaufman-Osborn |
2017-07-25 |
| 9698015 |
Method for patterning a semiconductor substrate |
— |
2017-07-04 |
| 9666414 |
Process chamber for etching low k and other dielectric films |
Dmitry Lubomirsky, Ellie Yieh, Sergey G. Belostotskiy |
2017-05-30 |
| 9640385 |
Gate electrode material residual removal process |
Bhargav S. Citla, Chentsau Ying |
2017-05-02 |
| 9620407 |
3D material modification for advanced processing |
Ludovic Godet, Erica Chen, Jun Xue, Ellie Yieh, Gary E. Dickerson |
2017-04-11 |
| 9595467 |
Air gap formation in interconnection structure by implantation process |
Jun Xue, Ludovic Godet, Erica Chen, Ellie Yieh |
2017-03-14 |
| 9583339 |
Method for forming spacers for a transistor gate |
Nicolas Posseme, Thibaut David, Olivier Joubert, Thorsten Lill, Laurent Vallier |
2017-02-28 |
| 9548201 |
Self-aligned multiple spacer patterning schemes for advanced nanometer technology |
Ying Zhang, Uday Mitra, Praburam Gopalraja, Hua Chung |
2017-01-17 |
| 9543163 |
Methods for forming features in a material layer utilizing a combination of a main etching and a cyclical etching process |
Mang-Mang Ling, Jungmin Ko, Sean S. Kang, Jeremiah T. Pender, Bradley J. Howard |
2017-01-10 |
| 9540736 |
Methods of etching films with reduced surface roughness |
Benjamin Schmiege, Nitin K. Ingle, Jeffrey W. Anthis, Xikun Wang, Jie Liu +1 more |
2017-01-10 |
