| 9850569 |
Ion implantation for superconductor tape fabrication |
Connie P. Wang, Paul J. Murphy, Paul Sullivan, Frank Sinclair, Morgan Evans |
2017-12-26 |
| 9852902 |
Material deposition for high aspect ratio structures |
Jun Xue, Martin A. Hilkene, Matthew D. Scotney-Castle |
2017-12-26 |
| 9829790 |
Immersion field guided exposure and post-exposure bake process |
Douglas A. Buchberger, Jr., Sang Ki Nam, Viachslav Babayan, Christine Y Ouyang, Srinivas D. Nemani |
2017-11-28 |
| 9823570 |
Field guided post exposure bake application for photoresist microbridge defects |
Sang Ki Nam, Christine Y Ouyang |
2017-11-21 |
| 9815091 |
Roll to roll wafer backside particle and contamination removal |
Christopher S. Ngai, Huixiong Dai, Ellie Yieh |
2017-11-14 |
| 9798240 |
Controlling photo acid diffusion in lithography processes |
Peng Xie, Christopher Dennis Bencher |
2017-10-24 |
| 9777378 |
Advanced process flow for high quality FCVD films |
Srinivas D. Nemani, Erica Chen, Jun Xue, Ellie Yieh |
2017-10-03 |
| 9773675 |
3D material modification for advanced processing |
Srinivas D. Nemani, Erica Chen, Jun Xue, Ellie Yieh, Gary E. Dickerson |
2017-09-26 |
| 9767987 |
Method and system for modifying substrate relief features using ion implantation |
Patrick M. Martin, Timothy J. Miller, Vikram Singh |
2017-09-19 |
| 9754791 |
Selective deposition utilizing masks and directional plasma treatment |
Yin Fan, Ellie Yieh, Srinivas D. Nemani |
2017-09-05 |
| 9748148 |
Localized stress modulation for overlay and EPE |
Ellie Yieh, Huixiong Dai, Srinivas D. Nemani, Christopher Dennis Bencher |
2017-08-29 |
| 9733579 |
Tooling configuration for electric/magnetic field guided acid profile control in a photoresist layer |
Sang Ki Nam, Peng Xie, Qiwei Liang |
2017-08-15 |
| 9716005 |
Plasma poisoning to enable selective deposition |
Srinivas D. Nemani, Tobin Kaufman-Osborn |
2017-07-25 |
| 9620407 |
3D material modification for advanced processing |
Srinivas D. Nemani, Erica Chen, Jun Xue, Ellie Yieh, Gary E. Dickerson |
2017-04-11 |
| 9620335 |
In situ control of ion angular distribution in a processing apparatus |
Costel Biloiu, Nini Munoz, Anthony Renau |
2017-04-11 |
| 9613859 |
Direct deposition of nickel silicide nanowire |
Annamalai Lakshmanan, Bencherki Mebarki, Kaushal K. Singh, Paul F. Ma, Mehul Naik +1 more |
2017-04-04 |
| 9595467 |
Air gap formation in interconnection structure by implantation process |
Jun Xue, Erica Chen, Srinivas D. Nemani, Ellie Yieh |
2017-03-14 |
| 9553174 |
Conversion process utilized for manufacturing advanced 3D features for semiconductor device applications |
Christopher R. Hatem, Matthew D. Scotney-Castle, Martin A. Hilkene |
2017-01-24 |
| 9534289 |
Plasma process chambers employing distribution grids having focusing surfaces thereon enabling angled fluxes to reach a substrate, and related methods |
Jun Xue, Qiwei Liang |
2017-01-03 |
