Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9553147 | Trench formation with CD less than 10nm for replacement fin growth | Ying Zhang | 2017-01-24 |
| 9548201 | Self-aligned multiple spacer patterning schemes for advanced nanometer technology | Ying Zhang, Uday Mitra, Praburam Gopalraja, Srinivas D. Nemani | 2017-01-17 |