Issued Patents 2011
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8053368 | Method for removing residues from a patterned substrate | Sean D. Burns, Steven J. Holmes | 2011-11-08 |
| 8039203 | Integrated circuits and methods of design and manufacture thereof | Helen Wang, Scott D. Halle, Henning Haffner, Haoren Zhuang, Klaus Herold +4 more | 2011-10-18 |
| 8033814 | Device for holding a template for use in imprint lithography | Todd C. Bailey, Byung-Jin Choi, Sidlgata V. Sreenivasan, Carlton G. Willson, John Ekerdt | 2011-10-11 |
| 8017194 | Method and material for a thermally crosslinkable random copolymer | Gregory Breyta | 2011-09-13 |
| 7993815 | Line ends forming | Allen H. Gabor, Scott D. Halle, Donald J. Samuels | 2011-08-09 |
| 7994060 | Dual exposure track only pitch split process | Sean D. Burns, Steven J. Holmes | 2011-08-09 |
| 7993816 | Method for fabricating self-aligned nanostructure using self-assembly block copolymers, and structures fabricated therefrom | Charles T. Black, David L. Rath | 2011-08-09 |
| 7982312 | Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning | Kenneth Raymond Carter, Gary M. McClelland, Dirk Pfeiffer | 2011-07-19 |
| 7972965 | Process for interfacial adhesion in laminate structures through patterned roughing of a surface | Edward C. Cooney, III, Vincent J. McGahay, Thomas M. Shaw, Anthony K. Stamper | 2011-07-05 |
| 7948051 | Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same | Stephen M. Gates, Jeffrey Hedrick, Elbert E. Huang, Satyanarayana V. Nitta, Sampath Purushothaman +1 more | 2011-05-24 |
| 7947907 | Electronics structures using a sacrificial multi-layer hardmask scheme | Ricardo A. Donaton, Conal E. Murray, Satyanarayana V. Nitta, Sampath Purushothaman, Sujatha Sankaran +2 more | 2011-05-24 |
| 7892940 | Device and methodology for reducing effective dielectric constant in semiconductor devices | Daniel C. Edelstein, Edward C. Cooney, III, Timothy J. Dalton, John A. Fitzsimmons, Jeffrey P. Gambino +10 more | 2011-02-22 |
| 7883828 | Functionalized carbosilane polymers and photoresist compositions containing the same | Robert David Allen, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong | 2011-02-08 |
| 7883832 | Method and apparatus for direct referencing of top surface of workpiece during imprint lithography | Yves Martin, Theodore G. van Kessel, Hematha K. Wickramasinghe | 2011-02-08 |
| 7862989 | Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning | Kenneth Raymond Carter, Gary M. McClelland, Dirk Pfeiffer | 2011-01-04 |
| 7863150 | Method to generate airgaps with a template first scheme and a self aligned blockout mask | Daniel C. Edelstein, Satya V. Nitta, Sampath Purushothaman, Shom Ponth | 2011-01-04 |
| 7862982 | Chemical trim of photoresist lines by means of a tuned overcoat material | Sean D. Burns, Steven J. Holmes, Wu-Song Huang | 2011-01-04 |