Issued Patents 2011
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8034532 | High contact angle topcoat material and use thereof in lithography process | Phillip Brock, Carl E. Larson, Ratnam Sooriyakumaran, Linda Karin Sundberg, Hoa D. Truong | 2011-10-11 |
| 8029971 | Photopatternable dielectric materials for BEOL applications and methods for use | Phillip Brock, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more | 2011-10-04 |
| 8026293 | Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials | Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Mark Whitney Hart, Robert D. Miller, Ratnam Sooriyakumaran | 2011-09-27 |
| 8011517 | Composite membranes with performance enhancing layers | James L. Hedrick, Young-Hye Na, Alshakim Nelson, Ratnam Sooriyakumaran | 2011-09-06 |
| 7951524 | Self-topcoating photoresist for photolithography | Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders, Mark Steven Slezak +4 more | 2011-05-31 |
| 7944055 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | Phillip Brock, Blake Davis, Wu-Song Huang, Qinghuang Lin, Alshakim Nelson +2 more | 2011-05-17 |
| 7919225 | Photopatternable dielectric materials for BEOL applications and methods for use | Phillip Brock, Blake Davis, Geraud Jean-Michel Dubois, Qinghuang Lin, Robert D. Miller +3 more | 2011-04-05 |
| 7910290 | Photoresist topcoat for a photolithographic process | Ratnam Sooriyakumaran, Linda Karin Sundberg | 2011-03-22 |
| 7901868 | Photoresist topcoat for a photolithographic process | Rutnam Sooriyakumaran, Linda Karin Sundberg | 2011-03-08 |
| 7883828 | Functionalized carbosilane polymers and photoresist compositions containing the same | Matthew E. Colburn, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong | 2011-02-08 |
| 7867689 | Method of use for photopatternable dielectric materials for BEOL applications | Phillip Brock, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more | 2011-01-11 |