Issued Patents 2011
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8053537 | Method for using a topcoat composition | Hiroshi Ito | 2011-11-08 |
| 8034532 | High contact angle topcoat material and use thereof in lithography process | Robert David Allen, Phillip Brock, Carl E. Larson, Ratnam Sooriyakumaran, Hoa D. Truong | 2011-10-11 |
| 8003309 | Photoresist compositions and methods of use in high index immersion lithography | Hiroshi Ito, Daniel P. Sanders | 2011-08-23 |
| 7993812 | Calixarene blended molecular glass photoresists and processes of use | Luisa D. Bozano, Hiroshi Ito | 2011-08-09 |
| 7989026 | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films | Joy Cheng, Ho-Cheol Kim, Charles Thomas Rettner, Daniel P. Sanders, Ratnam Sooriyakumaran | 2011-08-02 |
| 7951524 | Self-topcoating photoresist for photolithography | Robert David Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders +4 more | 2011-05-31 |
| 7931829 | Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures | Geraud Jean-Michel Dubois, James L. Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang +3 more | 2011-04-26 |
| 7910290 | Photoresist topcoat for a photolithographic process | Robert David Allen, Ratnam Sooriyakumaran | 2011-03-22 |
| 7901868 | Photoresist topcoat for a photolithographic process | Robert David Allen, Rutnam Sooriyakumaran | 2011-03-08 |