Issued Patents 2011
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8084193 | Self-segregating multilayer imaging stack with built-in antireflective properties | Joy Cheng, Dario L. Goldfarb, David R. Medeiros, Dirk Pfeifer, Libor Vylicky | 2011-12-27 |
| 8003309 | Photoresist compositions and methods of use in high index immersion lithography | Hiroshi Ito, Linda Karin Sundberg | 2011-08-23 |
| 7989026 | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films | Joy Cheng, Ho-Cheol Kim, Charles Thomas Rettner, Ratnam Sooriyakumaran, Linda Karin Sundberg | 2011-08-02 |
| 7951524 | Self-topcoating photoresist for photolithography | Robert David Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Mark Steven Slezak +4 more | 2011-05-31 |
| 7906031 | Aligning polymer films | Joy Cheng, Ratnam Sooriyakumaran | 2011-03-15 |
| 7883828 | Functionalized carbosilane polymers and photoresist compositions containing the same | Robert David Allen, Matthew E. Colburn, Ratnam Sooriyakumaran, Hoa D. Truong | 2011-02-08 |