Issued Patents 2011
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8034532 | High contact angle topcoat material and use thereof in lithography process | Robert David Allen, Carl E. Larson, Ratnam Sooriyakumaran, Linda Karin Sundberg, Hoa D. Truong | 2011-10-11 |
| 8029971 | Photopatternable dielectric materials for BEOL applications and methods for use | Robert David Allen, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more | 2011-10-04 |
| 7951524 | Self-topcoating photoresist for photolithography | Robert David Allen, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders, Mark Steven Slezak +4 more | 2011-05-31 |
| 7944055 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | Robert David Allen, Blake Davis, Wu-Song Huang, Qinghuang Lin, Alshakim Nelson +2 more | 2011-05-17 |
| 7919225 | Photopatternable dielectric materials for BEOL applications and methods for use | Robert David Allen, Blake Davis, Geraud Jean-Michel Dubois, Qinghuang Lin, Robert D. Miller +3 more | 2011-04-05 |
| 7867689 | Method of use for photopatternable dielectric materials for BEOL applications | Robert David Allen, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more | 2011-01-11 |