Issued Patents 2011
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8034532 | High contact angle topcoat material and use thereof in lithography process | Robert David Allen, Phillip Brock, Carl E. Larson, Linda Karin Sundberg, Hoa D. Truong | 2011-10-11 |
| 8029971 | Photopatternable dielectric materials for BEOL applications and methods for use | Robert David Allen, Phillip Brock, Blake Davis, Qinghuang Lin, Robert D. Miller +1 more | 2011-10-04 |
| 8026293 | Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials | Robert David Allen, Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Mark Whitney Hart, Robert D. Miller | 2011-09-27 |
| 8011517 | Composite membranes with performance enhancing layers | Robert David Allen, James L. Hedrick, Young-Hye Na, Alshakim Nelson | 2011-09-06 |
| 7989026 | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films | Joy Cheng, Ho-Cheol Kim, Charles Thomas Rettner, Daniel P. Sanders, Linda Karin Sundberg | 2011-08-02 |
| 7951524 | Self-topcoating photoresist for photolithography | Robert David Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders +4 more | 2011-05-31 |
| 7951525 | Low outgassing photoresist compositions | Richard Anthony DiPietro, Sally A. Swanson, Hoa D. Truong | 2011-05-31 |
| 7944055 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | Robert David Allen, Phillip Brock, Blake Davis, Wu-Song Huang, Qinghuang Lin +2 more | 2011-05-17 |
| 7927664 | Method of step-and-flash imprint lithography | Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Robert D. Miller | 2011-04-19 |
| 7919225 | Photopatternable dielectric materials for BEOL applications and methods for use | Robert David Allen, Phillip Brock, Blake Davis, Geraud Jean-Michel Dubois, Qinghuang Lin +3 more | 2011-04-05 |
| 7910290 | Photoresist topcoat for a photolithographic process | Robert David Allen, Linda Karin Sundberg | 2011-03-22 |
| 7906031 | Aligning polymer films | Joy Cheng, Daniel P. Sanders | 2011-03-15 |
| 7901864 | Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition | Wu-Song Huang, Marie Angelopoulos, Timothy A. Brunner, Dirk Pfeiffer | 2011-03-08 |
| 7883828 | Functionalized carbosilane polymers and photoresist compositions containing the same | Robert David Allen, Matthew E. Colburn, Daniel P. Sanders, Hoa D. Truong | 2011-02-08 |
| 7867689 | Method of use for photopatternable dielectric materials for BEOL applications | Robert David Allen, Phillip Brock, Blake Davis, Qinghuang Lin, Robert D. Miller +1 more | 2011-01-11 |