Issued Patents 2011
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7982312 | Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning | Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland | 2011-07-19 |
| 7968270 | Process of making a semiconductor device using multiple antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Richard A. Conti, Allen H. Gabor +2 more | 2011-06-28 |
| 7914975 | Multiple exposure lithography method incorporating intermediate layer patterning | Sean D. Burns, Allen H. Gabor, Scott D. Halle | 2011-03-29 |
| 7901864 | Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition | Wu-Song Huang, Marie Angelopoulos, Timothy A. Brunner, Ratnam Sooriyakumaran | 2011-03-08 |
| 7879717 | Polycarbosilane buried etch stops in interconnect structures | Elbert E. Huang, Kaushik A. Kumar, Kelly Malone, Muthumanickam Sankarapandian, Christy S. Tyberg | 2011-02-01 |
| 7862989 | Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning | Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland | 2011-01-04 |