SH

Steven J. Holmes

IBM: 19 patents #60 of 9,568Top 1%
FS Freeescale Semiconductor: 1 patents #222 of 817Top 30%
📍 Ossining, NY: #1 of 95 inventorsTop 2%
🗺 New York: #26 of 10,473 inventorsTop 1%
Overall (2011): #697 of 364,097Top 1%
19
Patents 2011

Issued Patents 2011

Showing 1–19 of 19 patents

Patent #TitleCo-InventorsDate
8053368 Method for removing residues from a patterned substrate Sean D. Burns, Matthew E. Colburn 2011-11-08
8039334 Shared gate for conventional planar device and horizontal CNT Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Mark E. Masters 2011-10-18
8009268 Immersion optical lithography system having protective optical coating Toshiharu Furukawa, Charles W. Koburger, III, Naim Moumen 2011-08-30
8004024 Field effect transistor Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III 2011-08-23
7994575 Metal-oxide-semiconductor device structures with tailored dopant depth profiles Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Larry Nesbit 2011-08-09
7994060 Dual exposure track only pitch split process Sean D. Burns, Matthew E. Colburn 2011-08-09
7989222 Method of making integrated circuit chip utilizing oriented carbon nanotube conductive layers Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell 2011-08-02
7985643 Semiconductor transistors with contact holes close to gates Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, William R. Tonti 2011-07-26
7951660 Methods for fabricating a metal-oxide-semiconductor device structure Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Larry Nesbit 2011-05-31
7932549 Carbon nanotube conductor for trench capacitors Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Larry Nesbit 2011-04-26
7932167 Phase change memory cell with vertical transistor Toshiharu Furukawa, John G. Gaudiello, Mark C. Hakey, David V. Horak, Charles W. Koburger, III +1 more 2011-04-26
7923202 Layer patterning using double exposure processes in a single photoresist layer Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III 2011-04-12
7922796 Chemical and particulate filters containing chemically modified carbon nanotube structures Mark C. Hakey, David V. Horak, James G. Ryan 2011-04-12
7898045 Passive electrically testable acceleration and voltage measurement devices Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Charles W. Koburger, III, Leah Pastel 2011-03-01
7892968 Via gouging methods and related semiconductor structure Shyng-Tsong Chen, David V. Horak, Takeshi Nogami, Shom Ponoth, Chih-Chao Yang 2011-02-22
7888241 Selective deposition of germanium spacers on nitride Ashima B. Chakravarti, Anthony I. Chou, Toshiharu Furukawa, Wesley C. Nazle 2011-02-15
7889317 Immersion lithography with equalized pressure on at least projection optics component and wafer Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Peter H. Mitchell 2011-02-15
7883829 Lithography for pitch reduction Xuefeng Hua, Willard E. Conley 2011-02-08
7862982 Chemical trim of photoresist lines by means of a tuned overcoat material Sean D. Burns, Matthew E. Colburn, Wu-Song Huang 2011-01-04