Issued Patents All Time
Showing 101–125 of 130 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7453070 | Methods and apparatus for beam density measurement in two dimensions | Atul Gupta, Gregg Norris | 2008-11-18 |
| 7442944 | Ion beam implant current, spot width and position tuning | Shengwu Chang, Antonella Cucchetti, Joseph P. Dzengeleski, Gregory Gibilaro, Rosario Mollica +2 more | 2008-10-28 |
| 7402820 | Ion beam contamination determination | Russell J. Low, Antonella Cucchetti, Anthony Renau, Marie Welsch | 2008-07-22 |
| 7397047 | Technique for tuning an ion implanter system | Shengwu Chang, Damian Brennan | 2008-07-08 |
| 7394078 | Technique for ion beam angle spread control for advanced applications | Atul Gupta | 2008-07-01 |
| 7394073 | Methods and apparatus for ion beam angle measurement in two dimensions | James J. Cummings, Arthur H. Clough, Eric D. Hermanson, Rosario Mollica, Paul J. Murphy +1 more | 2008-07-01 |
| 7391038 | Technique for isocentric ion beam scanning | Anthony Renau | 2008-06-24 |
| 7361913 | Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control | Russell J. Low, David Roger Timberlake, James McLane, Mark D. Saunders, James J. Cummings +2 more | 2008-04-22 |
| 7358510 | Ion implanter with variable scan frequency | Morgan Evans | 2008-04-15 |
| 7355188 | Technique for uniformity tuning in an ion implanter system | Jonathan Gerald England, Morgan Evans, Douglas Thomas Fielder, Gregg Norris, Shengwu Chang +2 more | 2008-04-08 |
| 7348576 | Technique for ion beam angle process control | Atul Gupta | 2008-03-25 |
| RE40009 | Methods and apparatus for adjusting beam parallelism in ion implanters | Anthony Renau | 2008-01-22 |
| 7276847 | Cathode assembly for indirectly heated cathode ion source | Leo V. Klos, Anthony Renau, Nicholas A. Venuto | 2007-10-02 |
| 7253423 | Technique for uniformity tuning in an ion implanter system | Shengwu Chang, Damian Brennan | 2007-08-07 |
| 7250617 | Ion beam neutral detection | Anthony Renau, Eric D. Hermanson, Gordon C. Angel | 2007-07-31 |
| 7202483 | Methods and apparatus for ion beam angle measurement in two dimensions | Eric D. Hermanson, Rosario Mollica, Paul J. Murphy | 2007-04-10 |
| 7170067 | Ion beam measurement apparatus and method | Anthony Renau, Eric D. Hermanson, Gordon C. Angel | 2007-01-30 |
| 7166854 | Uniformity control multiple tilt axes, rotating wafer and variable scan velocity | Anthony Renau, Donna L. Smatlak, Jun Lu | 2007-01-23 |
| 7161161 | Uniformity control using multiple fixed wafer orientations and variable scan velocity | Anthony Renau, Donna L. Smatlak, Jun Lu | 2007-01-09 |
| 7138768 | Indirectly heated cathode ion source | Peter E. Maciejowski, Shengwu Chang, Bjorn O. Pedersen, Leo V. Klos, Daniel Distaso +1 more | 2006-11-21 |
| 7102139 | Source arc chamber for ion implanter having repeller electrode mounted to external insulator | Russell J. Low, Eric R. Cobb, Leo V. Klos | 2006-09-05 |
| 7045799 | Weakening focusing effect of acceleration-deceleration column of ion implanter | Shengwu Chang, Donald F. Anderson, Daniel McGillicuddy | 2006-05-16 |
| 6984831 | Gas flow restricting cathode system for ion implanter and related method | Russell J. Low, Curt D. Bergeron, Eric R. Cobb, Jeffrey A. Burgess | 2006-01-10 |
| 6791094 | Method and apparatus for determining beam parallelism and direction | Donna L. Smatlak, Paul A. Daniel | 2004-09-14 |
| 6777686 | Control system for indirectly heated cathode ion source | Daniel Distaso, Anthony Renau | 2004-08-17 |