Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12347687 | Etch rate modulation of FinFET through high-temperature ion implantation | Qintao Zhang, Rajesh Prasad | 2025-07-01 |
| 11942324 | Method for BEOL metal to dielectric adhesion | Qintao Zhang, Ting Cai, Ma Ning, Weiye He, Jian Kang | 2024-03-26 |
| 11875995 | Techniques and apparatus for anisotropic stress compensation in substrates using ion implantation | Scott Falk, Qintao Zhang | 2024-01-16 |
| 11574796 | Dual XY variable aperture in an ion implantation system | Frank Sinclair, Shane Conley, Michael Honan | 2023-02-07 |
| 11569063 | Apparatus, system and method for energy spread ion beam | Paul J. Murphy, Frank Sinclair, Daniel R. Tieger, Anthony Renau | 2023-01-31 |
| 11201057 | Techniques and apparatus for anisotropic stress compensation in substrates using ion implantation | Scott Falk, Qintao Zhang | 2021-12-14 |
| 11114277 | Dual cathode ion source | Bon-Woong Koo, Frank Sinclair, Eric D. Hermanson, Joseph E. Pierro, Michael D. Johnson +2 more | 2021-09-07 |
| 10741361 | Dual cathode ion source | Bon-Woong Koo, Frank Sinclair, Eric D. Hermanson, Joseph E. Pierro, Michael D. Johnson +2 more | 2020-08-11 |
| 10446372 | Dual cathode ion source | Bon-Woong Koo, Frank Sinclair, Eric D. Hermanson, Joseph E. Pierro, Michael D. Johnson +2 more | 2019-10-15 |
| 9978554 | Dual cathode ion source | Bon-Woong Koo, Frank Sinclair, Eric D. Hermanson, Joseph E. Pierro, Michael D. Johnson +2 more | 2018-05-22 |
| 8129695 | System and method for controlling deflection of a charged particle beam within a graded electrostatic lens | Peter L. Kellerman, Frank Sinclair, Victor M. Benveniste | 2012-03-06 |
| 7166854 | Uniformity control multiple tilt axes, rotating wafer and variable scan velocity | Anthony Renau, Joseph C. Olson, Donna L. Smatlak | 2007-01-23 |
| 7161161 | Uniformity control using multiple fixed wafer orientations and variable scan velocity | Anthony Renau, Joseph C. Olson, Donna L. Smatlak | 2007-01-09 |
| 6207964 | Continuously variable aperture for high-energy ion implanter | Edward K. McIntyre, Donald E. DeLuca, Gerald L. Dionne, Paul A. Loomis, Hans J. Rutishauser +1 more | 2001-03-27 |
| 6194734 | Method and system for operating a variable aperture in an ion implanter | Paul A. Loomis, Hans J. Rutishauser, Michiro Sugitani, Toru Murakami, Hiroshi Sogabe | 2001-02-27 |