Issued Patents All Time
Showing 26–50 of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7482283 | Thin film forming method and thin film forming device | Hideaki Yamasaki | 2009-01-27 |
| 7456109 | Method for cleaning substrate processing chamber | Hideaki Yamasaki, Kazuhito Nakamura, Koumei Matsuzawa, Tsukasa Matsuda | 2008-11-25 |
| 7419702 | Method for processing a substrate | Kazuhito Nakamura, Cory Wajda, Enrico Mosca, Gert Leusink, Fenton R. McFeely +1 more | 2008-09-02 |
| 7361595 | Transition metal thin film forming method | Hideaki Yamasaki, Susumu Arima | 2008-04-22 |
| 7344754 | Film formation method | Hideaki Yamasaki, Tatsuo Hatano | 2008-03-18 |
| 7189431 | Method for forming a passivated metal layer | Hideaki Yamasaki, Kazuhito Nakamura, Gert Leusink, Fenton R. McFeely, Paul C. Jamison | 2007-03-13 |
| 7105060 | Method of forming an oxidation-resistant TiSiN film | Yukihiro Shimogaki | 2006-09-12 |
| 7078341 | Method of depositing metal layers from metal-carbonyl precursors | Hideaki Yamasaki, Tsukasa Matsuda, Atsushi Gomi, Tatsuo Hatano, Masahito Sugiura +3 more | 2006-07-18 |
| 7067422 | Method of forming a tantalum-containing gate electrode structure | Kazuhito Nakamura, Hideaki Yamasaki, Gert Leusink, Fenton R. McFeely, John J. Yurkas +1 more | 2006-06-27 |
| 7063871 | CVD process capable of reducing incubation time | Hideaki Yamasaki, Tatsuo Hatano, Tsukasa Matsuda, Taro Ikeda, Kazuhito Nakamura +2 more | 2006-06-20 |
| 6989321 | Low-pressure deposition of metal layers from metal-carbonyl precursors | Hideaki Yamasaki, Tsukasa Matsuda, Atsushi Gomi, Tatsuo Hatano, Masahito Sugiura +3 more | 2006-01-24 |
| 6966936 | Processing system, evacuating system for processing system, low-pressure CVD system, and evacuating system and trapping device for low-pressure CVD system | Hideaki Yamasaki, Kenichi Kubo, Susumu Arima | 2005-11-22 |
| 6924223 | Method of forming a metal layer using an intermittent precursor gas flow process | Hideaki Yamasaki, Tsukasa Matsuda, Atsushi Gomi, Tatsuo Hatano, Mitsuhiro Tachibana +6 more | 2005-08-02 |
| 6919268 | Method of manufacturing a WN contact plug | Hideaki Yamasaki | 2005-07-19 |
| 6913996 | Method of forming metal wiring and semiconductor manufacturing apparatus for forming metal wiring | Hideaki Yamasaki, Mitsuhiro Tachibana, Kazuya Okubo, Kenji Suzuki | 2005-07-05 |
| 6846711 | Method of making a metal oxide capacitor, including a barrier film | Hideaki Yamasaki | 2005-01-25 |
| 6797068 | Film forming unit | Hideaki Yamasaki, Takashi Mochizuki, Susumu Arima | 2004-09-28 |
| 6793969 | Method of forming an oxidation-resistant TiSiN film | Yukihiro Shimogaki | 2004-09-21 |
| 6548112 | Apparatus and method for delivery of precursor vapor from low vapor pressure liquid sources to a CVD chamber | Joseph T. Hillman, Tugrul Yasar, Kenichi Kubo, Vincent Vezin, Hideaki Yamasaki +2 more | 2003-04-15 |
| 6489198 | Semiconductor device and method of manufacturing the same | Hideaki Yamasaki | 2002-12-03 |
| 6486063 | Semiconductor device manufacturing method for a copper connection | Hideaki Yamasaki | 2002-11-26 |
| 6436203 | CVD apparatus and CVD method | Takeshi Kaizuka, Takashi Horiuchi, Masami Mizukami, Takashi Mochizuki, Hideaki Yamasaki | 2002-08-20 |
| 6399484 | Semiconductor device fabricating method and system for carrying out the same | Hideaki Yamasaki, Satoshi Yonezawa, Susumu Arima, Mitsuhiro Tachibana, Keizo Hosoda | 2002-06-04 |
| 6210486 | CVD film forming method in which a film formation preventing gas is supplied in a direction from a rear surface of an object to be processed | Masami Mizukami, Takashi Mochizuki | 2001-04-03 |
| 6089184 | CVD apparatus and CVD method | Takeshi Kaizuka, Takashi Horiuchi, Masami Mizukami, Takashi Mochizuki, Hideaki Yamasaki | 2000-07-18 |