Issued Patents All Time
Showing 26–50 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8399353 | Methods of forming copper wiring and copper film, and film forming system | Tadahiro Ishizaka, Atsushi Gomi, Takara Kato, Osamu Yokoyama, Takashi Sakuma +4 more | 2013-03-19 |
| 8349283 | Metal recovery method, metal recovery apparatus, gas exhaust system and film forming device using same | Masamichi Hara, Atsushi Gomi | 2013-01-08 |
| 8277889 | Film formation method and film formation apparatus | Atsushi Gomi, Yasushi Mizusawa, Masamichi Hara, Osamu Yokoyama, Satoshi Taga | 2012-10-02 |
| 8273409 | Method for film formation, apparatus for film formation, and computer-readable recording medium | Masamichi Hara, Yasushi Mizusawa, Satoshi Taga, Atsushi Gomi | 2012-09-25 |
| 8133811 | Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, computer program and storage medium | Yasuhiko Kojima, Taro Ikeda | 2012-03-13 |
| 8129271 | Film forming method, film forming apparatus and storage medium | Yasuhiko Kojima, Taro Ikeda | 2012-03-06 |
| 8029873 | Film deposition method and film deposition apparatus of metal film | Taro Ikeda, Yasushi Mizusawa, Osamu Yokoyama, Takashi Sakuma | 2011-10-04 |
| 8026176 | Film forming method, plasma film forming apparatus and storage medium | Takashi Sakuma, Taro Ikeda, Osamu Yokoyama, Tsukasa Matsuda, Yasushi Mizusawa | 2011-09-27 |
| 7879399 | CV method using metal carbonyl gas | Hideaki Yamasaki | 2011-02-01 |
| 7790626 | Plasma sputtering film deposition method and equipment | Taro Ikeda, Kenji Suzuki, Yasushi Mizusawa | 2010-09-07 |
| 7491430 | Deposition method for forming a film including metal, nitrogen and carbon | Tadahiro Ishizaka, Atsushi Gomi | 2009-02-17 |
| 7427426 | CVD method for forming metal film by using metal carbonyl gas | Hideaki Yamasaki | 2008-09-23 |
| 7344754 | Film formation method | Hideaki Yamasaki, Yumiko Kawano | 2008-03-18 |
| 7078341 | Method of depositing metal layers from metal-carbonyl precursors | Hideaki Yamasaki, Tsukasa Matsuda, Atsushi Gomi, Masahito Sugiura, Yumiko Kawano +3 more | 2006-07-18 |
| 7063871 | CVD process capable of reducing incubation time | Hideaki Yamasaki, Tsukasa Matsuda, Taro Ikeda, Kazuhito Nakamura, Koumei Matsuzawa +2 more | 2006-06-20 |
| 6989321 | Low-pressure deposition of metal layers from metal-carbonyl precursors | Hideaki Yamasaki, Tsukasa Matsuda, Atsushi Gomi, Masahito Sugiura, Yumiko Kawano +3 more | 2006-01-24 |
| 6924223 | Method of forming a metal layer using an intermittent precursor gas flow process | Hideaki Yamasaki, Tsukasa Matsuda, Atsushi Gomi, Mitsuhiro Tachibana, Koumei Matsuzava +6 more | 2005-08-02 |
| 6659111 | Cleaning gas and method for cleaning vacuum treatment apparatus by flowing the cleaning gas | Isamu Mouri, Tetsuya Tamura, Mitsuya Ohashi, Tadayuki Kawashima, Masahiko Matsudo | 2003-12-09 |
| 6169032 | CVD film formation method | Seishi Murakami | 2001-01-02 |
| 6153515 | Method of forming multilayered film | Seishi Murakami | 2000-11-28 |
| 6126994 | Liquid material supply apparatus and method | Seishi Murakami | 2000-10-03 |
| 6080444 | CVD film forming method including annealing and film forming performed at substantially the same pressure | Takaya Shimizu | 2000-06-27 |
| 5989345 | Process-gas supply apparatus | — | 1999-11-23 |
| 5963834 | Method for forming a CVD film | Seishi Murakami, Keishi Akiba, Takaya Shimizu | 1999-10-05 |
| 5954887 | Cleaning processing method of a film forming apparatus | — | 1999-09-21 |