Issued Patents All Time
Showing 51–75 of 75 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6713239 | Developing method and developing apparatus | Tsutae Omori, Yoshio Kimura | 2004-03-30 |
| 6709523 | Silylation treatment unit and method | Tsutae Omori, Masami Yamashita | 2004-03-23 |
| 6688020 | Substrate processing apparatus | Tadashi Iino | 2004-02-10 |
| 6656273 | Film forming method and film forming system | Nobuo Konishi, Yoji Mizutani | 2003-12-02 |
| 6634806 | Substrate processing method and substrate processing apparatus | Takehiko Orii | 2003-10-21 |
| 6620260 | Substrate rinsing and drying method | Yoshio Kumagai | 2003-09-16 |
| 6613692 | Substrate processing method and apparatus | Kinya Ueno, Miyako Yamasaka, Hideyuki Tsutsumi, Tadashi Iino, Yuji Kamikawa | 2003-09-02 |
| 6551400 | Coating apparatus | Keizo Hasbe, Shuuichi Nishikido, Nobuo Konishi, Kazutoshi Yoshioka | 2003-04-22 |
| 6536452 | Processing apparatus and processing method | Kyouji Kohama, Eiji Shimbo, Yuji Kamikawa, Hiroki Ohno | 2003-03-25 |
| 6514073 | Resist processing method and resist processing apparatus | Nobuo Konishi | 2003-02-04 |
| 6503003 | Film forming method and film forming apparatus | Keizo Hasebe, Shuuichi Nishikido, Nobuo Konishi, Kazutoshi Yoshioka | 2003-01-07 |
| 6491452 | Developing method and developing apparatus | Nobuo Konishi, Tsutae Omori | 2002-12-10 |
| 6398429 | Developing method and developing apparatus | Tsutae Omori, Yoshio Kimura | 2002-06-04 |
| 6257778 | Method for developing front surface of substrate with improved developing function of developing solution and apparatus thereof | Nobuo Konishi | 2001-07-10 |
| 6238848 | Developing method and developing apparatus | Nobuo Konishi, Tsutae Omori | 2001-05-29 |
| 6228561 | Film forming method and film forming apparatus | Keizo Hasebe, Shuuichi Nishikido, Nobuo Konishi, Kazutoshi Yoshioka | 2001-05-08 |
| 6143478 | Resist processing method | Nobuo Konishi | 2000-11-07 |
| 6097469 | Method of processing resist onto substrate and resist processing apparatus | Hidetami Yaegashi, Yasunori Kawakami, Jae Hoon Park, Keiko Kanzawa, Takayuki Katano +1 more | 2000-08-01 |
| 6017663 | Method of processing resist utilizing alkaline component monitoring | Hidetami Yaegashi, Yasunori Kawakami, Jae Hoon Park, Keiko Kanzawa, Takayuki Katano +1 more | 2000-01-25 |
| 5932380 | Method of processing resist utilizing alkaline component monitoring | Hidetami Yaegashi, Yasunori Kawakami, Jae Hoon Park, Keiko Kanzawa, Takayuki Katano +1 more | 1999-08-03 |
| 5928390 | Vertical processing apparatus | Hidetami Yaegashi, Masami Akimoto, Eiji Yamaguchi, Junichi Kitano, Takayuki Katano +2 more | 1999-07-27 |
| 5817185 | Method for washing substrates | Naoki Shindo, Shigenori Kitahara, Kenji Yokomizo | 1998-10-06 |
| 5730162 | Apparatus and method for washing substrates | Naoki Shindo, Shigenori Kitahara, Kenji Yokomizo | 1998-03-24 |
| 5633040 | Method and apparatus for treating film coated on substrate | Tohru Aoyama | 1997-05-27 |
| 4899686 | Coating device | Osamu Hirakawa | 1990-02-13 |