MI

Mitsuaki Iwashita

TL Tokyo Electron Limited: 54 patents #45 of 5,567Top 1%
KT Kabushiki Kaisha Toshiba: 2 patents #9,982 of 21,451Top 50%
AU A School Corporation Kansai University: 1 patents #30 of 98Top 35%
Toshiba Memory: 1 patents #1,210 of 1,971Top 65%
TL Toyko Electron Limited: 1 patents #1 of 31Top 4%
Overall (All Time): #45,261 of 4,157,543Top 2%
55
Patents All Time

Issued Patents All Time

Showing 26–50 of 55 patents

Patent #TitleCo-InventorsDate
9505019 Plating apparatus, plating method and storage medium Yuichiro Inatomi, Takashi Tanaka 2016-11-29
9487865 Plating apparatus, plating method and storage medium Yuichiro Inatomi, Takashi Tanaka 2016-11-08
9421569 Plating apparatus, plating method and storage medium Takashi Tanaka, Yusuke Saito, Takayuki Toshima 2016-08-23
9255331 Apparatus for plating process Takashi Tanaka, Yusuke Saito 2016-02-09
9236280 Substrate processing apparatus, substrate processing method, and storage medium Takayuki Toshima, Yuji Kamikawa, Mikio Nakashima 2016-01-12
8999432 Cap metal forming method Takashi Tanaka, Yusuke Saito 2015-04-07
8937014 Liquid treatment apparatus and liquid treatment method Takashi Tanaka, Yusuke Saito 2015-01-20
8770138 Semiconductor manufacturing apparatus and semiconductor manufacturing method Kenichi Hara, Takashi Tanaka, Takayuki Toshima, Takehiko Orii 2014-07-08
8771429 Supercritical drying method for semiconductor substrate and supercritical drying apparatus Linan Ji, Hidekazu Hayashi, Hiroshi Tomita, Hisashi Okuchi, Yohei Sato +5 more 2014-07-08
8691497 Developing treatment method Yuichiro Inatomi 2014-04-08
8465596 Supercritical processing apparatus and supercritical processing method Takayuki Toshima, Kazuyuki Mitsuoka, Hidekazu Okamoto, Hideo Namatsu 2013-06-18
8383522 Micro pattern forming method Shigeru Nakajima, Kazuhide Hasebe, Pao-Hwa Chou, Reiji Niino 2013-02-26
8372212 Supercritical drying method and apparatus for semiconductor substrates Yohei Sato, Hisashi Okuchi, Hiroshi Tomita, Hidekazu Hayashi, Yukiko Kitajima +5 more 2013-02-12
8206785 Cap metal forming method Takayuki Toshima, Takashi Tanaka, Yusuke Saito 2012-06-26
8168375 Patterning method Shigeru Nakajima, Kazuhide Hasebe, Pao-Hwa Chou, Reiji Niino 2012-05-01
8168377 Pattern forming method and method of manufacturing semiconductor device by using the same Kazuyuki Mitsuoka, Makoto Muramatsu 2012-05-01
8062955 Substrate processing method and substrate processing apparatus Takashi Tanaka, Kenichi Hara 2011-11-22
8003509 Semiconductor manufacturing apparatus and semiconductor manufacturing method Kenichi Hara, Takashi Tanaka, Takayuki Toshima, Takehiko Orii 2011-08-23
7989354 Patterning method Shigeru Nakajima, Kazuhide Hasebe, Pao-Hwa Chou, Reiji Niino 2011-08-02
7781342 Substrate treatment method for etching a base film using a resist pattern Satoru Shimura, Keiji Tanouchi 2010-08-24
7754622 Patterning method utilizing SiBN and photolithography Pao-Hwa Chou, Kazuhide Hasebe, Shigeru Nakajima, Yasushi Akasaka, Reiji Niino 2010-07-13
7521098 Method of processing an organic-film Kazuyuki Mitsuoka, Tadashi Onishi, Minoru Honda, Ryuichi Asako 2009-04-21
7195936 Thin film processing method and system Tadashi Onishi, Manabu Hama, Minoru Honda, Kazuyuki Mitsuoka 2007-03-27
6800546 Film forming method by radiating a plasma on a surface of a low dielectric constant film Nobuo Konishi, Hiroki Ohno, Shigeru Kawamura, Masahito Sugiura 2004-10-05
6683006 Film forming method and film forming apparatus Nobuo Konishi 2004-01-27