Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8568534 | Method for washing device substrate | Hidekazu Okamoto | 2013-10-29 |
| 8465596 | Supercritical processing apparatus and supercritical processing method | Takayuki Toshima, Mitsuaki Iwashita, Kazuyuki Mitsuoka, Hidekazu Okamoto | 2013-06-18 |
| 8143203 | Method for washing device substrate | Hidekazu Okamoto | 2012-03-27 |
| 8026047 | Resist pattern forming method, supercritical processing solution for lithography process, and antireflection film forming method | Mitsuru Sato | 2011-09-27 |
| 7977036 | Resist pattern forming method | Mitsuru Sato | 2011-07-12 |
| 6576066 | Supercritical drying method and supercritical drying apparatus | — | 2003-06-10 |
| 6554507 | Pattern formation method and apparatus | — | 2003-04-29 |
| 6358673 | Pattern formation method and apparatus | — | 2002-03-19 |
| 5811872 | Semiconductor device and method of farbricating the same | Katsuyuki Machida, Katsumi Murase, Nobuhiro Shimoyama, Toshiaki Tsuchiya, Junichi Takahashi +3 more | 1998-09-22 |
| 5512513 | Method of fabricating semiconductor device with water protective film | Katsuyuki Machida, Katsumi Murase, Nobuhiro Shimoyama, Toshiaki Tsuchiya, Junichi Takahashi +3 more | 1996-04-30 |
| 5376590 | Semiconductor device and method of fabricating the same | Katsuyuki Machida, Katsumi Murase, Nobuhiro Shimoyama, Toshiaki Tsuchiya, Junichi Takahashi +3 more | 1994-12-27 |
| 4738916 | Intermediate layer material of three-layer resist system | Akira Yoshikawa | 1988-04-19 |
| 4615782 | Intermediate layer material of three-layer resist system and method of forming resist pattern | Akira Yoshikawa | 1986-10-07 |