Issued Patents All Time
Showing 151–170 of 170 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8877602 | Mechanisms of doping oxide for forming shallow trench isolation | Yu-Lien Huang, Chun Hsiung Tsai, Chii-Ming Wu | 2014-11-04 |
| 8877599 | Method of forming a semiconductor device | Tsan-Chun Wang, De-Wei Yu | 2014-11-04 |
| 8853025 | FinFET/tri-gate channel doping for multiple threshold voltage tuning | Ying Zhang, Jeffrey Junhao Xu | 2014-10-07 |
| 8809171 | Methods for forming FinFETs having multiple threshold voltages | Jeffrey Junhao Xu, Ying Zhang | 2014-08-19 |
| 8592915 | Doped oxide for shallow trench isolation (STI) | Yu-Lien Huang, Chun Hsiung Tsai, Chii-Ming Wu | 2013-11-26 |
| 8501570 | Method of manufacturing source/drain structures | Jeff J. Xu, Ming-Jie Huang, Yimin Huang, Zhiqiang Wu, Min Cao | 2013-08-06 |
| 8450193 | Techniques for temperature-controlled ion implantation | Jonathan Gerald England, Richard S. Muka, Edwin Arevalo, Vikram Singh | 2013-05-28 |
| 7878145 | Monitoring plasma ion implantation systems for fault detection and process control | Sung-Cheon Ko, Edmund J. Winder, Daniel Distaso, Ludovic Godet, Bon-Woong Koo +1 more | 2011-02-01 |
| 7687787 | Profile adjustment in plasma ion implanter | Ludovic Godet, George D. Papasouliotis, Richard Appel, Vincent Deno, Vikram Singh +1 more | 2010-03-30 |
| 7528389 | Profile adjustment in plasma ion implanter | Richard Appel, Vincent Deno, Vikram Singh, Harold Persing | 2009-05-05 |
| 7476849 | Technique for monitoring and controlling a plasma process | Bon-Woong Koo, Ludovic Godet, Vassilis Panayotis Vourloumis, Vikram Singh | 2009-01-13 |
| 7453059 | Technique for monitoring and controlling a plasma process | Bon-Woong Koo, Ludovic Godet, Vikram Singh, Vassilis Panayotis Vourloumis, Bernard G. Lindsay | 2008-11-18 |
| 7397048 | Technique for boron implantation | Vikram Singh, Edmund J. Winder, Harold Persing, Timothy J. Miller, Atul Gupta | 2008-07-08 |
| 7396746 | Methods for stable and repeatable ion implantation | Steven R. Walther, Justin Tocco, Carleton F. Ellis, III | 2008-07-08 |
| 6528805 | Dose monitor for plasma doping system | Matthew J. Goeckner | 2003-03-04 |
| 6527918 | Method and apparatus for low voltage plasma doping using dual pulses | Matthew J. Goeckner | 2003-03-04 |
| 6500496 | Hollow cathode for plasma doping system | Matthew J. Goeckner | 2002-12-31 |
| 6335536 | Method and apparatus for low voltage plasma doping using dual pulses | Matthew J. Goeckner | 2002-01-01 |
| 6300643 | Dose monitor for plasma doping system | Matthew J. Goeckner | 2001-10-09 |
| 6182604 | Hollow cathode for plasma doping system | Matthew J. Goeckner | 2001-02-06 |