Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9997325 | Electron beam exciter for use in chemical analysis in processing systems | Jimmy W. Hosch, Mike Whelan, Andrew Weeks Kueny, Kenneth C. Harvey, P.L. Stephan Thamban | 2018-06-12 |
| 6527918 | Method and apparatus for low voltage plasma doping using dual pulses | Ziwei Fang | 2003-03-04 |
| 6528805 | Dose monitor for plasma doping system | Ziwei Fang | 2003-03-04 |
| 6500496 | Hollow cathode for plasma doping system | Ziwei Fang | 2002-12-31 |
| 6433553 | Method and apparatus for eliminating displacement current from current measurements in a plasma processing system | Charles E. Van Wagoner | 2002-08-13 |
| 6335536 | Method and apparatus for low voltage plasma doping using dual pulses | Ziwei Fang | 2002-01-01 |
| 6300643 | Dose monitor for plasma doping system | Ziwei Fang | 2001-10-09 |
| 6182604 | Hollow cathode for plasma doping system | Ziwei Fang | 2001-02-06 |
| 6020592 | Dose monitor for plasma doping system | Reuel B. Liebert, Bjorn O. Pedersen | 2000-02-01 |