| 12174071 |
System, apparatus, and method for improved background correction and calibration of optical devices |
John D. Corless, Chris Pylant |
2024-12-24 |
| 10861755 |
System and method for measurement of complex structures |
— |
2020-12-08 |
| 10365212 |
System and method for calibration of optical signals in semiconductor process systems |
Mike Whelan, Mark Meloni, John D. Corless, Rick Daignault, Sean Lynes |
2019-07-30 |
| 9997325 |
Electron beam exciter for use in chemical analysis in processing systems |
Jimmy W. Hosch, Matthew J. Goeckner, Mike Whelan, Kenneth C. Harvey, P.L. Stephan Thamban |
2018-06-12 |
| 9772226 |
Referenced and stabilized optical measurement system |
John D. Corless, Mark Meloni |
2017-09-26 |
| 9386241 |
Apparatus and method for enhancing dynamic range of charge coupled device-based spectrograph |
— |
2016-07-05 |
| 9383323 |
Workpiece characterization system |
Mark Meloni, John D. Corless, Mike Whelan |
2016-07-05 |
| 8125633 |
Calibration of a radiometric optical monitoring system used for fault detection and process monitoring |
Mike Whelan, Kenneth C. Harvey, John D. Corless |
2012-02-28 |
| 7339682 |
Heterodyne reflectometer for film thickness monitoring and method for implementing |
Arun Ananth Aiyer, Mark Meloni, Kenneth C. Harvey |
2008-03-04 |
| 7049156 |
System and method for in-situ monitor and control of film thickness and trench depth |
— |
2006-05-23 |
| 6991514 |
Optical closed-loop control system for a CMP apparatus and method of manufacture thereof |
Mark Meloni |
2006-01-31 |
| 6642063 |
Apparatus for characterization of microelectronic feature quality |
Randall S. Mundt, Albert Lamm, Mike Whelan |
2003-11-04 |
| 6432729 |
Method for characterization of microelectronic feature quality |
Randall S. Mundt, Albert Lamm, Mike Whelan |
2002-08-13 |
| 6052188 |
Spectroscopic ellipsometer |
David U. Fluckiger |
2000-04-18 |
